A Single Bitline Highly Stable, Low Power With High Speed Half-Select Disturb Free 11T SRAM Cell

IF 2.2 4区 计算机科学 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE
Lokesh Soni, Neeta Pandey
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引用次数: 0

Abstract

A half-select disturb-free 11T (HF11T) static random access memory (SRAM) cell with low power, better stability and high speed is presented in this paper. The proposed SRAM cell works well with bit-interleaving design, which enhances soft-error immunity. A comparison of the proposed HF11T cell with other cutting-edge designs such as single-ended HS free 11T (SEHF11T), a shared-pass-gate 11T (SPG11T), data-dependent stack PMOS switching 10T (DSPS10T), a single-ended half-selected robust 12T (HSR12T), and 11T SRAM cells has been made. It exhibits 4.85 × /9.19 × less read delay (TRA) and write delay (TWA), respectively as compared to other considered SRAM cells. It achieves 1.07 × /1.02 × better read and write stability, respectively than the considered SRAM cells. It shows maximum reduction of 1.68 × /4.58 × /94.72 × /9 × /145 × leakage power, read power, write power consumption, read power delay product (PDP) and write PDP respectively, than the considered SRAM cells. In addition, the proposed HF11T cell achieves 10.14 × higher Ion/Ioff ratio than the other compared cells. These improvements come with a trade-off, resulting in 1.13 × more TRA compared to SPG11T. The simulation is performed with Cadence Virtuoso 45nm CMOS technology at supply voltage (VDD) of 0.6 V.

单比特线高稳定、低功耗、高速半选择无干扰 11T SRAM 单元
本文介绍了一种具有低功耗、更好稳定性和高速度的半选择无干扰 11T (HF11T) 静态随机存取存储器 (SRAM) 单元。所提出的 SRAM 单元采用位交错设计,能很好地增强软抗错能力。本文将拟议的 HF11T 单元与单端无 HS 11T (SEHF11T)、共享通门 11T (SPG11T)、数据依赖堆栈 PMOS 开关 10T (DSPS10T)、单端半选择稳健 12T (HSR12T) 和 11T SRAM 单元等其他先进设计进行了比较。与其他考虑过的 SRAM 单元相比,它的读取延迟(TRA)和写入延迟(TWA)分别减少了 4.85 × /9.19 ×。与其他 SRAM 单元相比,它的读取和写入稳定性分别提高了 1.07 × /1.02 ×。与所考虑的 SRAM 单元相比,它最大限度地降低了 1.68 × /4.58 × /94.72 × /9 × /145 × 漏功率、读功率、写功耗、读功率延迟积(PDP)和写功率延迟积(PDP)。此外,拟议的 HF11T 单元的离子/离子交换比比其他单元高出 10.14 倍。这些改进是有代价的,与 SPG11T 相比,TRA 增加了 1.13 倍。仿真采用 Cadence Virtuoso 45nm CMOS 技术,电源电压(VDD)为 0.6 V。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
ACM Transactions on Design Automation of Electronic Systems
ACM Transactions on Design Automation of Electronic Systems 工程技术-计算机:软件工程
CiteScore
3.20
自引率
7.10%
发文量
105
审稿时长
3 months
期刊介绍: TODAES is a premier ACM journal in design and automation of electronic systems. It publishes innovative work documenting significant research and development advances on the specification, design, analysis, simulation, testing, and evaluation of electronic systems, emphasizing a computer science/engineering orientation. Both theoretical analysis and practical solutions are welcome.
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