Edge smoothness enhancement of digital lithography based on the DMDs collaborative modulation

IF 2.4 4区工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Journal of Micromechanics and Microengineering Pub Date : 2024-06-27 DOI:10.1088/1361-6439/ad58e9

Jingya Zhang, Ningning Luo and Deyuan Chen

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引用次数: 0

Abstract

The rough saw-tooth edge caused by the inherent microstructures of digital micromirror device (DMD) will reduce the quality of the lithography pattern. Comprehensively considering the manufacturing efficiency, precision and cost, we propose a DMDs collaborative modulation lithography method to improve the smoothness of the lithography pattern edge. Through combining two misaligned DMDs to collaboratively modulate exposure dose, the better edge smoothness can be achieved. Collaborative exposure with 1/2 DMD pixel misalignment and 1/4 DMD pixel misalignment are both implemented to form the step-shape lithography patterns. The experimental results show that the saw-tooth edge can approximate to a straight line when increasing the number of times of the collaborative exposure. Further error analysis indicates it is effective to improve the edge smoothness while ensuring the lithography quality by using the collaborative modulation lithography. These results indicate that the DMDs collaborative modulation lithography is a promising technique for fabrication of microstructures, which may be a solution for balancing the fabrication precision, efficiency and cost.

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基于 DMD 协作调制的数字光刻边缘平滑度增强技术

数字微镜器件（DMD）固有的微结构所造成的粗糙锯齿边缘会降低光刻图案的质量。综合考虑制造效率、精度和成本，我们提出了一种 DMD 协同调制光刻方法，以提高光刻图案边缘的平滑度。通过结合两个错位的 DMD 来协同调制曝光剂量，可以获得更好的边缘平滑度。1/2 DMD 像素错位和 1/4 DMD 像素错位的协同曝光均可形成阶梯形光刻图案。实验结果表明，随着协同曝光次数的增加，锯齿边缘可以接近直线。进一步的误差分析表明，使用协同调制光刻技术能在保证光刻质量的同时有效提高边缘平滑度。这些结果表明，DMD 协同调制光刻技术是一种很有前途的微结构制造技术，它可能是一种平衡制造精度、效率和成本的解决方案。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Journal of Micromechanics and Microengineering 工程技术-材料科学：综合

CiteScore

4.50

自引率

4.30%

发文量

136

审稿时长

2.8 months

期刊介绍： Journal of Micromechanics and Microengineering (JMM) primarily covers experimental work, however relevant modelling papers are considered where supported by experimental data. The journal is focussed on all aspects of: -nano- and micro- mechanical systems -nano- and micro- electomechanical systems -nano- and micro- electrical and mechatronic systems -nano- and micro- engineering -nano- and micro- scale science Please note that we do not publish materials papers with no obvious application or link to nano- or micro-engineering. Below are some examples of the topics that are included within the scope of the journal: -MEMS and NEMS: Including sensors, optical MEMS/NEMS, RF MEMS/NEMS, etc. -Fabrication techniques and manufacturing: Including micromachining, etching, lithography, deposition, patterning, self-assembly, 3d printing, inkjet printing. -Packaging and Integration technologies. -Materials, testing, and reliability. -Micro- and nano-fluidics: Including optofluidics, acoustofluidics, droplets, microreactors, organ-on-a-chip. -Lab-on-a-chip and micro- and nano-total analysis systems. -Biomedical systems and devices: Including bio MEMS, biosensors, assays, organ-on-a-chip, drug delivery, cells, biointerfaces. -Energy and power: Including power MEMS/NEMS, energy harvesters, actuators, microbatteries. -Electronics: Including flexible electronics, wearable electronics, interface electronics. -Optical systems. -Robotics.