Zijin Yan, Huilong Zhu, Weixing Huang, Hong Yang, wang Qi, Shunshun Lu, shuai yang, Junjie Li, Na Zhou, yue Zhang, Yunfei Shi, Liang Xiang, wenliang Liu, binghui Wang, Yongkui Zhang, Junfeng Li, Jun Luo, Tianchun Ye
{"title":"A Common Source 3D FeFET with Disturb Inhibition Program and Erase Method","authors":"Zijin Yan, Huilong Zhu, Weixing Huang, Hong Yang, wang Qi, Shunshun Lu, shuai yang, Junjie Li, Na Zhou, yue Zhang, Yunfei Shi, Liang Xiang, wenliang Liu, binghui Wang, Yongkui Zhang, Junfeng Li, Jun Luo, Tianchun Ye","doi":"10.1149/2162-8777/ad57f1","DOIUrl":null,"url":null,"abstract":"\n A common source p-type single-crystal channel three-dimensional ferroelectric field-effect transistor (3D FeFET) in a 2×2×3 array is proposed. Two programming and erasing conditions are introduced. A large memory window (> 1.2 V), good retention (>10 years), and high speed (<100 ns) was presented under high voltage (±6 V) conditions. The endurance,>103, was observed under relatively low voltage (±3 V) conditions. Based on these two conditions, a novel asymmetric bias program and erase method is proposed to obtain good disturb inhibition. A more than 0.5 V threshold voltage shift in target cell was achieved while threshold voltage shift in unselected cell was limited, and analysis of long term disturb in novel method is proposed, showing good disturb inhibition. Additional investigation in word line disturbance shows causation and efficiency of disturb. Building upon the proposed structure of the 3D FeFET array, a vector matrix multiplication able to calculate 2-bit weights was designed and demonstrated. This work provides a potential solution for increasing integration density with 3D FeFET array.","PeriodicalId":504734,"journal":{"name":"ECS Journal of Solid State Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2024-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ECS Journal of Solid State Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1149/2162-8777/ad57f1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
A common source p-type single-crystal channel three-dimensional ferroelectric field-effect transistor (3D FeFET) in a 2×2×3 array is proposed. Two programming and erasing conditions are introduced. A large memory window (> 1.2 V), good retention (>10 years), and high speed (<100 ns) was presented under high voltage (±6 V) conditions. The endurance,>103, was observed under relatively low voltage (±3 V) conditions. Based on these two conditions, a novel asymmetric bias program and erase method is proposed to obtain good disturb inhibition. A more than 0.5 V threshold voltage shift in target cell was achieved while threshold voltage shift in unselected cell was limited, and analysis of long term disturb in novel method is proposed, showing good disturb inhibition. Additional investigation in word line disturbance shows causation and efficiency of disturb. Building upon the proposed structure of the 3D FeFET array, a vector matrix multiplication able to calculate 2-bit weights was designed and demonstrated. This work provides a potential solution for increasing integration density with 3D FeFET array.