A Common Source 3D FeFET with Disturb Inhibition Program and Erase Method

Zijin Yan, Huilong Zhu, Weixing Huang, Hong Yang, wang Qi, Shunshun Lu, shuai yang, Junjie Li, Na Zhou, yue Zhang, Yunfei Shi, Liang Xiang, wenliang Liu, binghui Wang, Yongkui Zhang, Junfeng Li, Jun Luo, Tianchun Ye
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Abstract

A common source p-type single-crystal channel three-dimensional ferroelectric field-effect transistor (3D FeFET) in a 2×2×3 array is proposed. Two programming and erasing conditions are introduced. A large memory window (> 1.2 V), good retention (>10 years), and high speed (<100 ns) was presented under high voltage (±6 V) conditions. The endurance,>103, was observed under relatively low voltage (±3 V) conditions. Based on these two conditions, a novel asymmetric bias program and erase method is proposed to obtain good disturb inhibition. A more than 0.5 V threshold voltage shift in target cell was achieved while threshold voltage shift in unselected cell was limited, and analysis of long term disturb in novel method is proposed, showing good disturb inhibition. Additional investigation in word line disturbance shows causation and efficiency of disturb. Building upon the proposed structure of the 3D FeFET array, a vector matrix multiplication able to calculate 2-bit weights was designed and demonstrated. This work provides a potential solution for increasing integration density with 3D FeFET array.
采用干扰抑制程序和擦除方法的共源 3D FeFET
提出了一种 2×2×3 阵列的共源 p 型单晶沟道三维铁电场效应晶体管(3D FeFET)。引入了两种编程和擦除条件。在相对较低的电压(±3 V)条件下,观察到了较大的存储窗口(> 1.2 V)、良好的保持能力(> 10 年)和较高的速度(103)。基于这两个条件,提出了一种新型非对称偏置编程和擦除方法,以获得良好的干扰抑制。目标单元的阈值电压偏移超过了 0.5 V,而非选择单元的阈值电压偏移受到了限制,并提出了新方法的长期干扰分析,显示出良好的干扰抑制效果。对字线干扰的进一步研究表明了干扰的成因和效率。在拟议的 3D FeFET 阵列结构基础上,设计并演示了能够计算 2 位权重的矢量矩阵乘法。这项工作为提高三维场效应晶体管阵列的集成密度提供了一个潜在的解决方案。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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