{"title":"Guiding principles for next generation of plasma research for microelectronics","authors":"A. Thompson","doi":"10.1063/10.0026320","DOIUrl":null,"url":null,"abstract":"Plasma applications, essential for semiconductor device manufacturing, must overcome several challenges to continue to drive progress.","PeriodicalId":507346,"journal":{"name":"Scilight","volume":"34 46","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-06-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Scilight","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1063/10.0026320","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Plasma applications, essential for semiconductor device manufacturing, must overcome several challenges to continue to drive progress.