Advanced facial recognition with LBP-URIGL hybrid descriptors

Q3 Engineering
Sajjad H. Hendi, Hazeem B. Taher, Karim Q. Hussein
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引用次数: 0

Abstract

Facial recognition technology is transformative in security and human-machine interaction, reshaping societal interactions. Robust descriptors, essential for high precision in machine learning tasks like recognition and recall, are integral to this transformation. This paper presents a hybrid model enhancing local binary pattern descriptors for facial representation. By integrating rotation-invariant local binary pattern with uniform rotation-invariant grey-level co-occurrence, employing linear discriminant analysis for feature space optimization, and utilizing an artificial neural network for classification, the model achieves exceptional accuracy rates of 100% for Olivetti Research Laboratory, 99.98% for Maastricht University Computer Vision Test, and 99.17% for Extended Yale B, surpassing traditional methods significantly.
利用 LBP-URIGL 混合描述符进行高级面部识别
人脸识别技术是安全和人机交互领域的变革性技术,重塑了社会互动。强大的描述符对于高精度的机器学习任务(如识别和召回)至关重要,是这一变革不可或缺的一部分。本文提出了一种混合模型,用于增强面部表示的局部二进制模式描述符。通过将旋转不变的局部二元模式与均匀旋转不变的灰度级共现整合在一起,采用线性判别分析进行特征空间优化,并利用人工神经网络进行分类,该模型在奥利维研究实验室的准确率达到 100%,在马斯特里赫特大学计算机视觉测试的准确率达到 99.98%,在扩展耶鲁 B 测试的准确率达到 99.17%,大大超过了传统方法。
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来源期刊
Pollack Periodica
Pollack Periodica Engineering-Civil and Structural Engineering
CiteScore
1.50
自引率
0.00%
发文量
82
期刊介绍: Pollack Periodica is an interdisciplinary, peer-reviewed journal that provides an international forum for the presentation, discussion and dissemination of the latest advances and developments in engineering and informatics. Pollack Periodica invites papers reporting new research and applications from a wide range of discipline, including civil, mechanical, electrical, environmental, earthquake, material and information engineering. The journal aims at reaching a wider audience, not only researchers, but also those likely to be most affected by research results, for example designers, fabricators, specialists, developers, computer scientists managers in academic, governmental and industrial communities.
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