Comprehensive theoretical investigation of NaAlX (X=C, Si and Ge) half-Heusler compounds: Unveiling the multifaceted properties for advanced applications

Ghanshyam Lal Menaria, Upasana Rani, Peeyush Kumar Kamlesh, Monika Rani, Nihal Singh, Dinesh C. Sharma, Ajay Singh Verma
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Abstract

In this work, we have extensively investigated the characteristics of ternary half-Heusler (HH) materials, specifically NaAlX (X[Formula: see text][Formula: see text][Formula: see text]C, Si and Ge), employing ab-initio computations in density functional theory (DFT) framework. Various aspects, including stability parameters, electronic, optical and thermoelectric (TE) parameters have been examined. The computed lattice constants of NaAlX (X[Formula: see text][Formula: see text][Formula: see text]C, Si and Ge) were found to be, respectively, 5.398, 6.301 and 6.389[Formula: see text]Å which are in excellent agreement with the previously available data. The electronic band structures showed that the studied materials exhibit semiconducting behavior with a corresponding band gap of 1.961, 0.999 and 0.846[Formula: see text]eV, respectively. Specifically, NaAlC and NaAlGe compounds were found to have a direct energy band gap at the [Formula: see text]-point, while NaAlSi displayed an indirect band gap at the [Formula: see text]–X point. Elastic and thermodynamic parameters were examined, confirming that the titled compounds possess mechanical, dynamic and thermal stability. Additionally, the optical response of the materials has been analyzed within an energy range of 0–13[Formula: see text]eV. The TE parameters exhibited maximum ZT values of 0.998, 0.992 and 0.990 for NaAlX (X[Formula: see text][Formula: see text][Formula: see text]C, Si and Ge) materials, respectively, at 300[Formula: see text]K, suggesting promising TE performance at room temperature.
对 NaAlX(X=C、Si 和 Ge)半休斯勒化合物的全面理论研究:揭示先进应用的多方面特性
在这项研究中,我们利用密度泛函理论(DFT)框架中的非线性计算,广泛研究了三元半休斯勒(HH)材料的特性,特别是 NaAlX(X[式:见正文][式:见正文][式:见正文]C、Si 和 Ge)。对包括稳定性参数、电子、光学和热电(TE)参数在内的各个方面进行了研究。计算得出的 NaAlX(X[式:见正文][式:见正文][式:见正文]C、Si 和 Ge)的晶格常数分别为 5.398、6.301 和 6.389[式:见正文]埃,与之前获得的数据非常吻合。电子能带结构显示,所研究的材料具有半导体特性,相应的能带隙分别为 1.961、0.999 和 0.846[式:见正文]eV。具体而言,NaAlC 和 NaAlGe 化合物在[式:见正文]点具有直接能带隙,而 NaAlSi 则在[式:见正文]-X 点具有间接能带隙。通过对弹性和热力学参数的研究,证实了这些命名化合物具有机械、动态和热稳定性。此外,还分析了材料在 0-13 [式中:见正文] eV 能量范围内的光学响应。在 300[式:见正文]K,NaAlX(X[式:见正文][式:见正文][式:见正文]C、Si 和 Ge)材料的 TE 参数显示出最大 ZT 值分别为 0.998、0.992 和 0.990,表明其在室温下具有良好的 TE 性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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