Single Crystal Growth and Transport Properties of Narrow Band Gap Semiconductor RhP2

De Sheng Wu, Ping Zheng, Jian Lin Luo
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Abstract

Here, we report the growth of high-quality single crystals of RhP2, and systematically study its structure and physical properties by transport, magnetism, and heat capacity measurements. Single-crystal X-ray diffraction revealed RhP2 adopts a monoclinic structure with the cell parameters a=5.7347(10) Å, b=5.7804(11) Å, and c=5.8222(11) Å, space group P21/c (No. 14). The electrical resistivity ρ(T) measurements indicate that RhP2 exhibits a narrow band gap behavior with the activation energies of 223.1 m eV and 27.4 m eV for two distinct regions, respectively. The temperature-dependent Hall effect measurements show electron domain transport behavior with a low charge carrier concentration. We found that RhP2 has a high mobility μe~210 cm2v-1s-1 with carrier concentrations ne~3.3×1018 cm-3 at 300 K with a narrow band gap feature. The high mobility μe reached a maximum of approximately 340 cm2v-1s-1 with carrier concentrations ne~2×1018 cm-3 at 100 K. No magnetic phase transitions were observed from the susceptibility χ(T) and specific heat Cp(T) measurements of RhP2. Our results not only offer effective potential as a material platform for studying exotic physical properties and electron band structures but also motivate further exploration of their potential photovoltaic and optoelectronic applications.
窄带隙半导体 RhP2 的单晶生长和传输特性
在此,我们报告了高质量 RhP2 单晶的生长情况,并通过输运、磁性和热容量测量系统地研究了其结构和物理性质。单晶 X 射线衍射显示 RhP2 呈单斜结构,晶胞参数 a=5.7347(10) Å,b=5.7804(11) Å,c=5.8222(11) Å,空间群 P21/c(No.14)。电阻率 ρ(T) 测量结果表明,RhP2 具有窄带隙特性,两个不同区域的活化能分别为 223.1 m eV 和 27.4 m eV。与温度相关的霍尔效应测量结果表明,电子域传输行为具有较低的电荷载流子浓度。我们发现,RhP2 在 300 K 时的载流子浓度为 ne~3.3×1018 cm-3 时具有高迁移率 μe~210 cm2v-1s-1,并具有窄带隙特征。在 100 K 时,载流子浓度 ne~2×1018 cm-3 时,高迁移率 μe 达到约 340 cm2v-1s-1 的最大值。从 RhP2 的磁感应强度 χ(T) 和比热 Cp(T) 测量结果中没有观察到磁相变。我们的研究结果不仅为研究奇异的物理性质和电子能带结构提供了有效的材料平台,而且激发了对其潜在的光伏和光电应用的进一步探索。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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