Thomas A Germer, T Brian Renegar, Ulf Griesmann, Johannes A Soons
{"title":"Linearizing the vertical scale of an interferometric microscope and its effect on step-height measurement","authors":"Thomas A Germer, T Brian Renegar, Ulf Griesmann, Johannes A Soons","doi":"10.1088/2051-672x/ad44bb","DOIUrl":null,"url":null,"abstract":"The vertical scale calibration of an interferometric microscope is important for establishing traceability of surface topography measurements to the International System of Units (SI) unit of length, the meter. Building on the calibration procedure for the amplification coefficient developed by de Groot and Beverage [<italic toggle=\"yes\">Proc. SPIE</italic>\n<bold>9526</bold>, 952610 (2015)], this paper describes a calibration procedure that yields the response curve for the entire vertical scan motion of a coherent scanning interferometric microscope. The method requires only a flat mirror as an artifact, a narrow band spectral filter, an aperture to reduce the effective numerical aperture, and the ability to raise and lower the microscope head so that the center of the interferogram can be varied within the scan range. The local frequency of the interferogram is determined by fitting sections of the interferogram to a sinusoidal function. The nonlinearity determined from the local frequency data can be used to estimate the uncertainty in uncorrected vertical height measurements. We describe how optical profile data can be corrected for nonlinearity due to dynamic effects in the scan motion and show that the correction improves the reproducibility of step height measurements by at least a factor of three and close to that of the repeatability.","PeriodicalId":22028,"journal":{"name":"Surface Topography: Metrology and Properties","volume":"20 1","pages":""},"PeriodicalIF":2.0000,"publicationDate":"2024-05-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface Topography: Metrology and Properties","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1088/2051-672x/ad44bb","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, MECHANICAL","Score":null,"Total":0}
引用次数: 0
Abstract
The vertical scale calibration of an interferometric microscope is important for establishing traceability of surface topography measurements to the International System of Units (SI) unit of length, the meter. Building on the calibration procedure for the amplification coefficient developed by de Groot and Beverage [Proc. SPIE9526, 952610 (2015)], this paper describes a calibration procedure that yields the response curve for the entire vertical scan motion of a coherent scanning interferometric microscope. The method requires only a flat mirror as an artifact, a narrow band spectral filter, an aperture to reduce the effective numerical aperture, and the ability to raise and lower the microscope head so that the center of the interferogram can be varied within the scan range. The local frequency of the interferogram is determined by fitting sections of the interferogram to a sinusoidal function. The nonlinearity determined from the local frequency data can be used to estimate the uncertainty in uncorrected vertical height measurements. We describe how optical profile data can be corrected for nonlinearity due to dynamic effects in the scan motion and show that the correction improves the reproducibility of step height measurements by at least a factor of three and close to that of the repeatability.
干涉显微镜的垂直刻度校准对于建立表面形貌测量与国际单位制(SI)长度单位米的可追溯性非常重要。基于 de Groot 和 Beverage 开发的放大系数校准程序[Proc. SPIE9526, 952610 (2015)],本文介绍了一种校准程序,可生成相干扫描干涉显微镜整个垂直扫描运动的响应曲线。该方法只需要一个平面镜作为假象、一个窄带光谱滤波器、一个用于减小有效数值孔径的孔径以及升降显微镜头的能力,以便在扫描范围内改变干涉图的中心。干涉图的局部频率是通过将干涉图的部分拟合为正弦函数来确定的。根据局部频率数据确定的非线性度可用于估算未校正垂直高度测量值的不确定性。我们介绍了如何对光学剖面数据进行非线性校正,以消除扫描运动中的动态效应,并表明校正后的阶跃高度测量的重现性至少提高了三倍,重复性也接近三倍。
期刊介绍:
An international forum for academics, industrialists and engineers to publish the latest research in surface topography measurement and characterisation, instrumentation development and the properties of surfaces.