{"title":"Microfabrication of Si by KOH Etchant Using Etching Masks Amorphized by Ion Beam Extracted From Electron Cyclotron Plasma","authors":"Mina Sato, Mie Tohnishi, Akihiro Matsutani","doi":"10.18494/sam4829","DOIUrl":null,"url":null,"abstract":"We demonstrated KOH etching with an etching mask amorphized by ion irradiation. Amorphized masks were prepared by irradiating ion species (Ar + , Kr + , Xe + , N + , O + ) at an ion energy of 500 eV with an electron cyclotron resonance ion shower system. The parameters for KOH etching were also studied. In addition, we fabricated structures with an aspect ratio of over 3000 and microfluidic devices using the proposed microfabrication technique. This technique is expected to be useful for the microfabrication of Si structures.","PeriodicalId":22154,"journal":{"name":"Sensors and Materials","volume":null,"pages":null},"PeriodicalIF":1.0000,"publicationDate":"2024-04-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Sensors and Materials","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.18494/sam4829","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"INSTRUMENTS & INSTRUMENTATION","Score":null,"Total":0}
引用次数: 0
Abstract
We demonstrated KOH etching with an etching mask amorphized by ion irradiation. Amorphized masks were prepared by irradiating ion species (Ar + , Kr + , Xe + , N + , O + ) at an ion energy of 500 eV with an electron cyclotron resonance ion shower system. The parameters for KOH etching were also studied. In addition, we fabricated structures with an aspect ratio of over 3000 and microfluidic devices using the proposed microfabrication technique. This technique is expected to be useful for the microfabrication of Si structures.
期刊介绍:
Sensors and Materials is designed to provide a forum for people working in the multidisciplinary fields of sensing technology, and publishes contributions describing original work in the experimental and theoretical fields, aimed at understanding sensing technology, related materials, associated phenomena, and applied systems. Expository review papers and short notes are also acceptable.