POLYIMIDE FILMS IMPLANTED BY MANGANESE IONS

Abstract

The optical and strength properties of Kapton polyimide films implanted with manganese ions with an energy of 40 keV and a dose of 5·1016 – 1·1017 cm–2 at a current density in the ion beam of 4 μA/cm2 have been studied. It has been experimentally established that during the process of ion implantation, modification of a thin nearsurface layer of polyimide occurs not only on the implanted side, but also on the reverse side of the film. Radiationstimulated modification of the back surface of the polyimide film leads to the formation of a surface layer up to 5 μm thick with increased microhardness. This may be due to the restructuring of metastable defects formed during the film manufacturing process and the simultaneous relaxation of elastic stresses in the surface layer. During the implantation process, a decrease in the intensity of absorption bands with maxima at ~ 2870 and ~ 2750 nm is observed, due to the evaporation of residual water under high vacuum conditions and reactions of residual solvent molecules, as well as radiation-induced processes on by-products of polyimide synthesis.