Kinetic Features of Plasma-Chemical Modification of Polyvinylidene Fluoride in Plasma

IF 0.9 4区化学 Q4 CHEMISTRY, PHYSICAL

High Energy Chemistry Pub Date : 2024-04-21 DOI:10.1134/s0018143924020127

T. G. Shikova, I. V. Kholodkov, S. A. Smirnov, B. L. Gorberg, M. O. Makeev, P. A. Mikhalev, A. S. Osipkov

引用次数: 0

Abstract

Changes in the composition of the surface layer of Nevaflon polyvinylidene fluoride film after treatment in gas discharges of various types (glow, dielectric barrier, corona) have been studied. The influence of the discharge type on the kinetics of etching and surface modification of polyvinylidene fluoride is shown. It has been found that the plasma treatment of polyvinylidene fluoride leads to a change in the modified surface layer of the polymer.

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等离子体中聚偏氟乙烯化学修饰的动力学特征

摘要研究了在各种类型的气体放电（辉光、介质阻挡、电晕）中处理聚偏氟乙烯薄膜后，其表面层成分的变化。放电类型对聚偏氟乙烯蚀刻和表面改性动力学的影响显而易见。研究发现，等离子体处理聚偏氟乙烯会导致聚合物表面改性层发生变化。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

High Energy Chemistry 化学-物理化学

CiteScore

1.50

自引率

28.60%

发文量

审稿时长

6-12 weeks

期刊介绍： High Energy Chemistry publishes original articles, reviews, and short communications on molecular and supramolecular photochemistry, photobiology, radiation chemistry, plasma chemistry, chemistry of nanosized systems, chemistry of new atoms, processes and materials for optical information systems and other areas of high energy chemistry. It publishes theoretical and experimental studies in all areas of high energy chemistry, such as the interaction of high-energy particles with matter, the nature and reactivity of short-lived species induced by the action of particle and electromagnetic radiation or hot atoms on substances in their gaseous and condensed states, and chemical processes initiated in organic and inorganic systems by high-energy radiation.