Joseph Garbarino, John G. Jones, Peter R. Stevenson, Cynthia T. Bowers, Krishnamurthy Mahalingam, and Lyuba Kuznetsova
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引用次数: 0
Abstract
Electrically tunable TiN/SiO2/TiN epsilon-near-zero photonic structures with various parameters were fabricated using the reactive DC magnetron sputtering approach. Effective medium approximation was used to predict the optical permittivity of a multilayered TiN/SiO2 metamaterial and guide the design/fabrication. Experimental reflectance measurements for tunable TiN/SiO2/TiN structures were obtained using the ellipsometer technique in the visible and near-infrared spectral ranges. Results show that reflectance for biased (12 V) and un-biased bulk TiN/SiO2/TiN structure changes up to ∼ 2% with the spectral shift at the ENZ spectral point ∼ 10 nm for samples with an optimal SiO2 dielectric layer (thickness d=10 nm). Reflectance measurements for multilayered tunable TiN/SiO2/TiN structures show strong variation in reflectance change for s- polarized light at epsilon-near-zero wavelengths due to applied voltage (12 V). We expect that the results of this research study of the tunable TiN/SiO2/TiN epsilon-near-zero photonic structures will potentially be useful for the photonic density of states engineering, surface sensing, and metamaterial-based super-resolution imaging.
期刊介绍:
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Optical Materials Express (OMEx), OSA''s open-access, rapid-review journal, primarily emphasizes advances in both conventional and novel optical materials, their properties, theory and modeling, synthesis and fabrication approaches for optics and photonics; how such materials contribute to novel optical behavior; and how they enable new or improved optical devices. The journal covers a full range of topics, including, but not limited to:
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