Engineering electrically tunable TiN/SiO2 epsilon-near-zero metamaterials

IF 2.8 3区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Joseph Garbarino, John G. Jones, Peter R. Stevenson, Cynthia T. Bowers, Krishnamurthy Mahalingam, and Lyuba Kuznetsova
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引用次数: 0

Abstract

Electrically tunable TiN/SiO2/TiN epsilon-near-zero photonic structures with various parameters were fabricated using the reactive DC magnetron sputtering approach. Effective medium approximation was used to predict the optical permittivity of a multilayered TiN/SiO2 metamaterial and guide the design/fabrication. Experimental reflectance measurements for tunable TiN/SiO2/TiN structures were obtained using the ellipsometer technique in the visible and near-infrared spectral ranges. Results show that reflectance for biased (12 V) and un-biased bulk TiN/SiO2/TiN structure changes up to ∼ 2% with the spectral shift at the ENZ spectral point ∼ 10 nm for samples with an optimal SiO2 dielectric layer (thickness d=10 nm). Reflectance measurements for multilayered tunable TiN/SiO2/TiN structures show strong variation in reflectance change for s- polarized light at epsilon-near-zero wavelengths due to applied voltage (12 V). We expect that the results of this research study of the tunable TiN/SiO2/TiN epsilon-near-zero photonic structures will potentially be useful for the photonic density of states engineering, surface sensing, and metamaterial-based super-resolution imaging.
电子可调 TiN/SiO2 epsilon-near-zero 超材料工程学
利用反应式直流磁控溅射方法制造了具有各种参数的电可调 TiN/SiO2/TiN epsilon-near-zero 光子结构。利用有效介质近似法预测了多层 TiN/SiO2 超材料的光导率,并为设计/制造提供了指导。利用椭偏仪技术在可见光和近红外光谱范围内对可调 TiN/SiO2/TiN 结构进行了反射率实验测量。结果表明,对于具有最佳 SiO2 介电层(厚度 d=10 nm)的样品,偏压(12 V)和非偏压块状 TiN/SiO2/TiN 结构的反射率随 ENZ 光谱点 ∼ 10 nm 处的光谱偏移变化可达 ∼ 2%。多层可调谐 TiN/SiO2/TiN 结构的反射率测量结果表明,在ε-近零波长处,s 偏振光的反射率变化因施加电压(12 V)而变化很大。我们希望这项关于可调谐 TiN/SiO2/TiN ε-近零光子结构的研究成果能在光子态密度工程、表面传感和基于超材料的超分辨率成像方面发挥潜在作用。
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来源期刊
Optical Materials Express
Optical Materials Express MATERIALS SCIENCE, MULTIDISCIPLINARY-OPTICS
CiteScore
5.50
自引率
3.60%
发文量
377
审稿时长
1.5 months
期刊介绍: The Optical Society (OSA) publishes high-quality, peer-reviewed articles in its portfolio of journals, which serve the full breadth of the optics and photonics community. Optical Materials Express (OMEx), OSA''s open-access, rapid-review journal, primarily emphasizes advances in both conventional and novel optical materials, their properties, theory and modeling, synthesis and fabrication approaches for optics and photonics; how such materials contribute to novel optical behavior; and how they enable new or improved optical devices. The journal covers a full range of topics, including, but not limited to: Artificially engineered optical structures Biomaterials Optical detector materials Optical storage media Materials for integrated optics Nonlinear optical materials Laser materials Metamaterials Nanomaterials Organics and polymers Soft materials IR materials Materials for fiber optics Hybrid technologies Materials for quantum photonics Optical Materials Express considers original research articles, feature issue contributions, invited reviews, and comments on published articles. The Journal also publishes occasional short, timely opinion articles from experts and thought-leaders in the field on current or emerging topic areas that are generating significant interest.
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