MATHEMATICAL MODELING OF IMPURITY MOTION ATOMS IN THE GRADIENT PRESSURE FIELD OF MELTS

Abstract

The paper explores the feasibility of purifying semiconductor materials by removing impurity atoms within a hydrostatic pressure gradient field. The study employs a computational experiment using a rapidly rotating disc with a slot-type internal cavity filled with an alloy melt containing impurity atoms as a model. To perform the calculations, a differential equation is formulated and solved, describing the movement of impurity atoms in response to the pressure gradient generated by the disc's rotation. The speed of movement of impurity atoms in the radial direction and the time of movement of atoms were determined by calculation.