Experimental studies of a new thermoelectric material based on semiconductor solid solution Ti1-xAlxNiSn

Y. Stadnyk, V. Romaka, L. Romaka, A. Horyn, V. Pashkevych
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Abstract

The structural, electrokinetic, and energetic properties of the Ti1-xAlxNiSn semiconductor solid solution, obtained by introducing of Al atoms into the structure of the TiNiSn half-Heusler phase by substituting Ti atoms in the crystallographic position 4a, were studied. It is shown that in the range of concentrations x = 0–0.01, Al atoms mainly replace Ni atoms in the 4c position, generating acceptor states. It was established that at temperatures T = 80–160 K, the ratio of concentrations of ionized acceptor and donor states in n-Ti1-xAlxNiSn, х = 0–0.04, is unchanged, but the concentration of donors is greater. At higher temperatures, T ≥ 250 K, deep donor states that existed in n-TiNiSn as a result of "a priori doping" of the semiconductor are ionized. An additional mechanism for the generation of donor states in n-Ti1-xAlxNiSn when the tetrahedral voids of the structure are partially occupied by Al atoms was revealed. The concentration ratio of the generated donor-acceptor states determines the position of the Fermi level εF and the conductivity mechanisms of n-Ti1-xAlxNiSn. The studied semiconductor solid solution is a promising thermoelectric material.
基于半导体固溶体 Ti1-xAlxNiSn 的新型热电材料的实验研究
通过在 TiNiSn 半海斯勒相的结构中引入 Al 原子,取代晶体学位置 4a 上的 Ti 原子,研究了 Ti1-xAlxNiSn 半导体固溶体的结构、电动力学和能量特性。研究表明,在浓度 x = 0-0.01 的范围内,铝原子主要取代 4c 位置上的镍原子,产生受体态。研究证实,在温度 T = 80-160 K 时,n-Ti1-xAlxNiSn 中电离的受体态和供体态的浓度比 х = 0-0.04 不变,但供体的浓度更大。在较高温度(T ≥ 250 K)下,n-TiNiSn 中因 "先验掺杂 "半导体而存在的深供体态被电离。当 n-Ti1-xAlxNiSn 结构中的四面体空隙被铝原子部分占据时,在 n-Ti1-xAlxNiSn 中生成供体态的另一种机制被揭示出来。生成的供体态和受体态的浓度比决定了费米级 εF 的位置和 n-Ti1-xAlxNiSn 的导电机制。所研究的半导体固溶体是一种很有前途的热电材料。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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