Impact of deposition voltage on the physical properties of rare earth element doped strontium sulphide for optoelectronic application

Q4 Engineering
S. O. Samuel, C. K. Ojoba, E. P. Ogherohwo, I. Ikhioya
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Abstract

In this study, electrochemical deposition was used to synthesize SrS-doped zirconium materials at a varying voltage of deposition. The  XRD result shows that SrS/Zr has a prominent peak intensity corresponding to 2theta values of 26.45o , 33.86o , 38.01o , and 51.49o . The  crystal lattice is shown by the prominent peak intensity with higher 2theta degree values; the appearance of an unindexed peak is caused  by the substrate utilized for the deposition. SrS surface morphology reveals a Clove-like surface with precipitate visible in the SrS  micrograph; the large grain size on the surface of the substrate exhibits photon absorption but lacks any signs of pinholes. At the  introduction of zirconium as a dopant to the SrS precursor, there was a drastic change in the precursor which is also noticed on the surface micrograph of the analyzed films. The films show a decrease in thickness from 129.14 to 120.09 nm and an increase in film  resistivity from 1.24 x 109 to 1.29 x 109 ohm.m, which further led to a decrease in conductivity from 8.06 x 108 to 7.75 x 108 S/m. The  impact of the deposition voltage on the reflectance reveals that lower voltage will stabilize the reflectance of SrS/Zr which will be useful  for photovoltaic applications. SrS has an energy bandgap of 1.50 eV while SrS/Zr with bandgap energy of 2.00 – 2.50 eV.  
沉积电压对用于光电应用的稀土元素掺杂硫化锶物理性质的影响
本研究采用电化学沉积法,在不同的沉积电压下合成了掺杂 SrS 的锆材料。XRD 结果表明,SrS/Zr 的 2theta 值分别为 26.45o、33.86o、38.01o 和 51.49o,具有明显的峰值强度。晶格显示为 2theta 度值越高,峰强度越大;出现无指数峰是由于沉积时使用的基底造成的。SrS 表面形态显示出类似丁香的表面,在 SrS 显微照片中可以看到沉淀物;衬底表面的大晶粒尺寸显示出光子吸收,但没有任何针孔迹象。在 SrS 前驱体中引入锆作为掺杂剂时,前驱体发生了急剧变化,这一点在分析薄膜的表面显微照片上也能看到。薄膜厚度从 129.14 纳米减少到 120.09 纳米,薄膜电阻率从 1.24 x 109 欧姆.米增加到 1.29 x 109 欧姆.米,这进一步导致导电率从 8.06 x 108 S/m 减少到 7.75 x 108 S/m。沉积电压对反射率的影响表明,较低的电压将稳定 SrS/Zr 的反射率,这将有助于光伏应用。SrS 的能带隙为 1.50 eV,而 SrS/Zr 的能带隙为 2.00 - 2.50 eV。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Nigerian Journal of Technological Development
Nigerian Journal of Technological Development Engineering-Engineering (miscellaneous)
CiteScore
1.00
自引率
0.00%
发文量
40
审稿时长
24 weeks
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