Structured illumination microscopy with extreme ultraviolet pulses

R. Mincigrucci, E. Paltanin, J. -S. Pelli-Cresi, F. Gala, E. Pontecorvo, L. Foglia, D. De Angelis, D. Fainozzi, A. Gessini, D. S. P. Molina, O. Stranik, F. Wechsler, R. Heintzmann, G. Ruocco, F. Bencivenga, C. Masciovecchio
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Abstract

The relentless pursuit of understanding matter at ever-finer scales has pushed optical microscopy to surpass the diffraction limit and produced the super-resolution microscopy which enables visualizing structures shorter than the wavelength of light. In the present work, we harnessed extreme ultraviolet beams to create a sub-{\mu}m grating structure, which was revealed by extreme ultraviolet structured illumination microscopy. This achievement marks the first step toward extending such a super-resolution technique into the X-ray regime, where achieving atomic-scale resolution becomes a charming possibility.
利用极紫外脉冲的结构照明显微技术
人们不懈地追求在更小的尺度上理解物质,这推动了光学显微镜超越衍射极限,并产生了超分辨率显微镜,它能够观察到比光的波长更短的结构。在本研究中,我们利用极紫外光束创建了一个亚{/mu}m光栅结构,并通过极紫外结构照明显微镜将其显示出来。这一成果标志着我们朝着将这种超分辨率技术扩展到X射线领域迈出了第一步,在X射线领域,实现原子尺度的分辨率已成为一种可能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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