{"title":"Design and fabrication of a sensors-integrated silicon electrode for gap status monitoring in micro electrochemical machining","authors":"Yulan Zhu, Guodong Liu, Yong Li, Hao Tong","doi":"10.1088/1361-6439/ad2c1f","DOIUrl":null,"url":null,"abstract":"The monitoring of micro machining gap and the control of machining status within the gap have become bottlenecks in the research and development of micro electrochemical machining (ECM). General electrical signals are difficult to reflect the status of micro machining gap. Electrolytic products in micro machining gap are prone to precipitation and retention, leading to unstable material removal process. Micro ECM urgently requires gap status monitoring and feedback control. To realize gap status monitoring, a sensors-integrated silicon electrode, with a micro temperature sensor and a micro conductivity sensor on the silicon electrode near-front sidewall, is proposed innovatively in this study. Based on bulk silicon process and electroplating process, sensors-integrated silicon electrodes are designed and fabricated. Based on the signal processing system built for the temperature and conductivity sensor, the temperature and conductivity detection functions are verified and the sensors are calibrated. Micro ECM experiments with sensors-integrated silicon electrodes are carried out and micro holes with 200 <italic toggle=\"yes\">μ</italic>m depth are machined. For the conductivity sensor on the sensors-integrated silicon electrode, due to the affection of electrolytic environment, the function surface is contaminated and damaged, and the structural design needs to be further improved. For the temperature sensor, it is not affected by the electrolytic environment due to insulation-film’s protection, and reliable temperature monitoring is achieved in micro ECM. The detection results indicate that the temperature inside the machining gap has increased by 20 °C due to the electrochemical thermal effect and resistance thermal effect in micro ECM, and the temperature shows an increasing trend while machining depth increasing. The feasibility of process monitoring with sensors-integrated silicon electrode in micro ECM is preliminarily verified.","PeriodicalId":16346,"journal":{"name":"Journal of Micromechanics and Microengineering","volume":"87 1","pages":""},"PeriodicalIF":2.4000,"publicationDate":"2024-03-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Micromechanics and Microengineering","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1088/1361-6439/ad2c1f","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
The monitoring of micro machining gap and the control of machining status within the gap have become bottlenecks in the research and development of micro electrochemical machining (ECM). General electrical signals are difficult to reflect the status of micro machining gap. Electrolytic products in micro machining gap are prone to precipitation and retention, leading to unstable material removal process. Micro ECM urgently requires gap status monitoring and feedback control. To realize gap status monitoring, a sensors-integrated silicon electrode, with a micro temperature sensor and a micro conductivity sensor on the silicon electrode near-front sidewall, is proposed innovatively in this study. Based on bulk silicon process and electroplating process, sensors-integrated silicon electrodes are designed and fabricated. Based on the signal processing system built for the temperature and conductivity sensor, the temperature and conductivity detection functions are verified and the sensors are calibrated. Micro ECM experiments with sensors-integrated silicon electrodes are carried out and micro holes with 200 μm depth are machined. For the conductivity sensor on the sensors-integrated silicon electrode, due to the affection of electrolytic environment, the function surface is contaminated and damaged, and the structural design needs to be further improved. For the temperature sensor, it is not affected by the electrolytic environment due to insulation-film’s protection, and reliable temperature monitoring is achieved in micro ECM. The detection results indicate that the temperature inside the machining gap has increased by 20 °C due to the electrochemical thermal effect and resistance thermal effect in micro ECM, and the temperature shows an increasing trend while machining depth increasing. The feasibility of process monitoring with sensors-integrated silicon electrode in micro ECM is preliminarily verified.
期刊介绍:
Journal of Micromechanics and Microengineering (JMM) primarily covers experimental work, however relevant modelling papers are considered where supported by experimental data.
The journal is focussed on all aspects of:
-nano- and micro- mechanical systems
-nano- and micro- electomechanical systems
-nano- and micro- electrical and mechatronic systems
-nano- and micro- engineering
-nano- and micro- scale science
Please note that we do not publish materials papers with no obvious application or link to nano- or micro-engineering.
Below are some examples of the topics that are included within the scope of the journal:
-MEMS and NEMS:
Including sensors, optical MEMS/NEMS, RF MEMS/NEMS, etc.
-Fabrication techniques and manufacturing:
Including micromachining, etching, lithography, deposition, patterning, self-assembly, 3d printing, inkjet printing.
-Packaging and Integration technologies.
-Materials, testing, and reliability.
-Micro- and nano-fluidics:
Including optofluidics, acoustofluidics, droplets, microreactors, organ-on-a-chip.
-Lab-on-a-chip and micro- and nano-total analysis systems.
-Biomedical systems and devices:
Including bio MEMS, biosensors, assays, organ-on-a-chip, drug delivery, cells, biointerfaces.
-Energy and power:
Including power MEMS/NEMS, energy harvesters, actuators, microbatteries.
-Electronics:
Including flexible electronics, wearable electronics, interface electronics.
-Optical systems.
-Robotics.