Optical design of reflective Bragg mirrors for EUV photolithography

IF 2 4区 物理与天体物理 Q3 OPTICS
Yu-Yen Tsai, Ting-Wei Chen
{"title":"Optical design of reflective Bragg mirrors for EUV photolithography","authors":"Yu-Yen Tsai, Ting-Wei Chen","doi":"10.1088/2040-8986/ad2e20","DOIUrl":null,"url":null,"abstract":"In this article. we investigate the optical characteristics of reflective extreme-ultraviolet (EUV) mirrors for the application of lithography for 7 nm node and below. By using the conventional quarter-wavelength stacked Bragg reflective configuration of Si-based metal multilayers centered at soft x-ray 13.5 nm, the maximum reflection is numerically computed to be approximately 0.7 at nearly normal incidence, which is consistent to the typical values reported by Advanced Semiconductor Materials Lithography (ASML) for Mo/Si stacked multilayers. The full width half maximum (FWHM) bandwidth is <inline-formula>\n<tex-math><?CDATA $0.65\\sim0.78$?></tex-math>\n<mml:math overflow=\"scroll\"><mml:mn>0.65</mml:mn><mml:mo>∼</mml:mo><mml:mn>0.78</mml:mn></mml:math>\n<inline-graphic xlink:href=\"joptad2e20ieqn1.gif\" xlink:type=\"simple\"></inline-graphic>\n</inline-formula> nm. In our numerical simulation, moreover, we find Nb/Si reflective mirrors can be potentially utilized to replace Mo/Si stacked multilayers in order to harvest more EUV light inside the scanners.","PeriodicalId":16775,"journal":{"name":"Journal of Optics","volume":"44 1","pages":""},"PeriodicalIF":2.0000,"publicationDate":"2024-03-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Optics","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1088/2040-8986/ad2e20","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"OPTICS","Score":null,"Total":0}
引用次数: 0

Abstract

In this article. we investigate the optical characteristics of reflective extreme-ultraviolet (EUV) mirrors for the application of lithography for 7 nm node and below. By using the conventional quarter-wavelength stacked Bragg reflective configuration of Si-based metal multilayers centered at soft x-ray 13.5 nm, the maximum reflection is numerically computed to be approximately 0.7 at nearly normal incidence, which is consistent to the typical values reported by Advanced Semiconductor Materials Lithography (ASML) for Mo/Si stacked multilayers. The full width half maximum (FWHM) bandwidth is 0.650.78  nm. In our numerical simulation, moreover, we find Nb/Si reflective mirrors can be potentially utilized to replace Mo/Si stacked multilayers in order to harvest more EUV light inside the scanners.
用于 EUV 光刻技术的反射布拉格反射镜的光学设计
本文研究了用于 7 纳米及以下光刻技术的反射式极紫外(EUV)反射镜的光学特性。通过使用以软 X 射线 13.5 纳米为中心的硅基金属多层板的传统四分之一波长堆叠布拉格反射配置,数值计算出在接近法线入射时的最大反射率约为 0.7,这与先进半导体材料光刻技术公司(ASML)报告的钼/硅堆叠多层板的典型值一致。全宽半最大(FWHM)带宽为 0.65∼0.78 nm。此外,在我们的数值模拟中,我们发现 Nb/Si 反射镜可以用来替代 Mo/Si 叠层多层膜,以便在扫描仪内采集更多的 EUV 光。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
CiteScore
4.50
自引率
4.80%
发文量
237
审稿时长
1.9 months
期刊介绍: Journal of Optics publishes new experimental and theoretical research across all areas of pure and applied optics, both modern and classical. Research areas are categorised as: Nanophotonics and plasmonics Metamaterials and structured photonic materials Quantum photonics Biophotonics Light-matter interactions Nonlinear and ultrafast optics Propagation, diffraction and scattering Optical communication Integrated optics Photovoltaics and energy harvesting We discourage incremental advances, purely numerical simulations without any validation, or research without a strong optics advance, e.g. computer algorithms applied to optical and imaging processes, equipment designs or material fabrication.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信