Combined use of XP-Endo Finisher and different chelating agents on the smear layer

Q3 Dentistry
Meenu Elizabeth Saju, Ramya Raghu, A. Shetty, Lekha Santhosh, Subhashini Rajasekhara, Priya C. Yadav
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Abstract

The aim of this study was to assess the effect of XP-Endo Finisher (XPF) in conjunction with three different chelating agents, namely, 0.2% chitosan nanoparticles (CNP), 17% ethylenediaminetetraacetic acid (EDTA), and 7% maleic acid (MA) on residual debris and smear layer on the root canal walls of the mandibular premolars. Eighty extracted human mandibular premolars were used in the study. Canals were prepared using an XP-Endo Shaper, and the final finishing was done with an XPF file. Teeth were randomly divided into four experimental groups based on chelating agents, Group I (XPF + 0.2% CNP), Group II (XPF + 17% EDTA), Group III (XPF + MA), and Group IV XPF + 2.5% sodium hypochlorite (NaOCl) (control group). Teeth were longitudinally split and prepared for scanning electron microscopy analysis. For comparing the smear layer and debris score between groups, the Kruskal–Wallis ANOVA was used, followed by the post hoc Bonferroni test. The level of significance was set at P < 0.05. Group I (XPF + 0.2% CNP) gave the best results (P = 0.001) in all the thirds of root canal, followed by Group II (XPF + 17% EDTA) with P = 0.001. Group III (XPF + MA) showed results similar to that of the control group (XPF + NaOCl) with P = 0.001. There was a significant difference in the scores between Group I (XPF + CNP) and the other three groups. In all three-thirds of a root canal, the use of XPF + 0.2% CNP performed best at removing the smear layer. This was followed by XPF + 17% EDTA and XPF + 7% MA. For all groups, smear layer removal was less efficient in the apical third.
在涂抹层上联合使用 XP-Endo Finisher 和不同的螯合剂
本研究的目的是评估 XP-Endo Finisher(XPF)与三种不同螯合剂(即 0.2% 壳聚糖纳米颗粒 (CNP)、17% 乙二胺四乙酸 (EDTA) 和 7% 马来酸 (MA))结合使用对下颌前磨牙根管壁残留碎屑和涂抹层的影响。 研究使用了 80 颗拔出的下颌前磨牙。使用 XP-Endo Shaper 准备根管,并使用 XPF 锉刀进行最后的修整。根据螯合剂将牙齿随机分为四个实验组:第一组(XPF + 0.2% CNP)、第二组(XPF + 17% EDTA)、第三组(XPF + MA)和第四组 XPF + 2.5% 次氯酸钠(NaOCl)(对照组)。将牙齿纵向劈开,准备进行扫描电子显微镜分析。比较各组间的涂片层和碎片得分时,采用 Kruskal-Wallis 方差分析,然后进行事后 Bonferroni 检验。显著性水平设定为 P <0.05。 第一组(XPF + 0.2% CNP)在所有三分之二根管中的效果最好(P = 0.001),其次是第二组(XPF + 17% EDTA),P = 0.001。第三组(XPF + MA)的结果与对照组(XPF + NaOCl)相似,P = 0.001。第一组(XPF + CNP)与其他三组的得分有明显差异。 在所有三分之二的根管中,使用 XPF + 0.2% CNP 清除涂抹层的效果最好。其次是 XPF + 17% EDTA 和 XPF + 7% MA。在所有组别中,根尖三分之一处去除涂抹层的效率较低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Endodontology
Endodontology Medicine-Anatomy
CiteScore
0.60
自引率
0.00%
发文量
0
审稿时长
28 weeks
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