Dry etching of epitaxial InGaAs/InAlAs/InAlGaAs structures for fabrication of photonic integrated circuits

S. Nazib, T. Hutchins-Delgado, Aadit Sharma, Hosuk Lee, Erum Jamil, N. Withers, Thomas J. Rotter, S. Addamane, John N. Nogan, Anthony James, Willard Ross, Douglas Pete, Gennady Smolyakov, Ganesh Balakrishnan, Marek Osiński
{"title":"Dry etching of epitaxial InGaAs/InAlAs/InAlGaAs structures for fabrication of photonic integrated circuits","authors":"S. Nazib, T. Hutchins-Delgado, Aadit Sharma, Hosuk Lee, Erum Jamil, N. Withers, Thomas J. Rotter, S. Addamane, John N. Nogan, Anthony James, Willard Ross, Douglas Pete, Gennady Smolyakov, Ganesh Balakrishnan, Marek Osiński","doi":"10.1364/ome.506739","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":506794,"journal":{"name":"Optical Materials Express","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2024-01-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Materials Express","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/ome.506739","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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干法蚀刻用于制造光子集成电路的外延 InGaAs/InAlAs/InAlGaAs 结构
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