Influence of annealing time on structural and electrical properties of Sb doped SnO2 films

M. Hemissi, H. Amardjia, H. Adnani, J. Plenet, B. Canut, J. Pelletier
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引用次数: 0

Abstract

Nanocrystalline 14 at % Sb-doped SnO2 films have been synthesized by a sol-gel method, to use them as solar cells electrodes. In this paper, we present a study of the annealing time of the films versus the increase of the particle size (varying from 6 nm to 19 nm) established by Scherer’s equation. We have also followed electrical resistance evolution with annealing temperature and time. An optimum value of 222 ; was measured on a sample annealed at 500 °C for 2 h. The crystalline structure of the films was characterized and phases identified by X ray diffraction in grazing incidence. Their thickness has been measured by spectroscopic ellipsometry around 200 nm.
退火时间对掺锑二氧化锡薄膜结构和电学特性的影响
我们采用溶胶-凝胶法合成了掺杂 14%锑的二氧化锡纳米晶薄膜,并将其用作太阳能电池电极。在本文中,我们根据舍勒方程,研究了薄膜退火时间与粒度(从 6 纳米到 19 纳米不等)增加的关系。我们还跟踪了电阻随退火温度和时间的变化。在 500 °C 下退火 2 小时的样品测得的最佳值为 222;。通过掠入射 X 射线衍射对薄膜的晶体结构进行了表征和相位鉴定。通过光谱椭偏仪测量了薄膜的厚度,约为 200 纳米。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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