The Mechanism of the Formation of Binary Compounds Between Zn and S Impurity Atoms in Si Crystal Lattice

IF 1 Q3 PHYSICS, MULTIDISCIPLINARY
N. F. Zikrillaev, Maruf K. Khakkulov, Bobir O. Isakov
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引用次数: 0

Abstract

The paper presents the results of an experimental study of surface morphology, elemental composition, electrophysical and optical properties of Si samples earlier doped with impurity atoms of Zn and S. The results of the study revealed a sufficient concentration of Zn and S elements on Si surface after diffusion (3.1% and 2.6% by weight, respectively). After additional thermal treatment at different temperatures, i.e., at 850°C and 875°C, the samples of I group have regained their initial parameters. However, it’s noteworthy that the mobility of charge carriers in group I samples was comparatively lower than that in group II samples allegedly under the influence of Zn and S binary molecules. After additional heat treatment of all samples at a temperature of 875°C, the authors have studied optical absorption coefficients. And their band gap energies were determined using the Tauc Plot method. According to the results of the study, the optical band gaps in group II and III samples were 1.12 eV, whereas the band gap energy in group I samples after additional thermal treatment at a temperature of 875 °C turned out to be 1.31 eV. Having theoretically calculated the band gap by applying Vegard’s law, the authors suggested that the new structure must be of Si0.92ZnS0.08 - type.
硅晶格中 Zn 和 S 杂质原子形成二元化合物的机理
本文介绍了对早期掺杂了 Zn 和 S 杂质原子的硅样品的表面形貌、元素组成、电物理和光学特性进行实验研究的结果。在不同温度(即 850°C 和 875°C)下进行额外热处理后,I 组样品恢复了初始参数。但值得注意的是,据称受 Zn 和 S 二元分子的影响,I 组样品的电荷载流子迁移率比 II 组样品低。在 875°C 的温度下对所有样品进行额外热处理后,作者研究了光吸收系数。它们的带隙能是用陶氏图法确定的。研究结果表明,第二组和第三组样品的光带隙为 1.12 eV,而第一组样品在 875 °C 温度下进行额外热处理后的带隙能量为 1.31 eV。作者运用 Vegard 定律对带隙进行了理论计算,认为新结构一定属于 Si0.92ZnS0.08 类型。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
East European Journal of Physics
East European Journal of Physics PHYSICS, MULTIDISCIPLINARY-
CiteScore
1.10
自引率
25.00%
发文量
58
审稿时长
8 weeks
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