Influence Annealing Process on Structural and Optical Properties of SnS Thin Films

Inass Abdulah Zgair, Abdulazeez O. Mousa Al-Ogaili, Khalid Haneen Abass
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Abstract

Thin film technology has helped offer an understanding of the crystalline structure of substances, further to the characteristics of electronic transitions and how they are used effectively in different applications.  This research focused on the effect of the process of annealing on the structural and optical characteristics of tin sulfide (SnS) thin films. The technique of thermal evaporation was used to synthesize the film samples under a vacuum of about 10–7 mbar. The coated SnS thin films were annealed at 200 °C and the structural and optical characteristics parameters, such as absorbance and transmittance, as well as optical bandgap and band-tail energies in the range )300–1150( nm, were discussed. Under the influence of the annealing process, the average crystal size changed from 14 nm to 11 nm. The energy gap value increased from 1.53 eV to 1.85 eV, while Urbach energy was seen to reduce from 0.913 eV for fabricated samples to be 0.824 eV after the annealing process.
退火工艺对 SnS 薄膜结构和光学特性的影响
薄膜技术有助于人们了解物质的晶体结构、电子转变的特征以及如何在不同的应用中有效地使用这些物质。 这项研究的重点是退火过程对硫化锡(SnS)薄膜的结构和光学特性的影响。采用热蒸发技术在约 10-7 毫巴的真空条件下合成薄膜样品。涂覆后的硫化锡薄膜在 200 ℃ 下退火,并讨论了其结构和光学特性参数,如吸收率和透射率,以及 300-1150( nm 范围内的光带隙和带尾能量。在退火工艺的影响下,平均晶体尺寸从 14 nm 变为 11 nm。能隙值从 1.53 eV 增加到 1.85 eV,而退火处理后的厄巴赫能从制备样品的 0.913 eV 降低到 0.824 eV。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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