Effect of SrO, ZrO2 on ion bombardment-resistant for the lead-silicate glass-based microchannel plate

Abstract

Microchannel plate (MCP) is an important charged particle electronic multiplier. Usually, electrons as the charged particles entered the input-end and strike the inner wall of the microchannel, producing an electron multiplication. Once the input particles changed into high-energy ions, colliding and sputtering effects would occur in the secondary electron multiplication generation processing of directly bombard on the microchannel plate. A poor ion bombardment-resistance property became the main bottleneck for the detection of high-energy ions of microchannel plate. In this paper, the (SrO, ZrO2) doped lead-silicate glass was as the cladding glass of microchannel plate and explored in the ion bombardment-resistant properties. Argon/cesium ion gun and laser confocal microscope were applied to investigate the ion etching and etching surface morphology of the lead-silicate glass microchannel plate, respectively. It impacted that (SrO, ZrO2) doped lead-silicate glass certainly benefited the ion-bombardment resistance of the MCP.