The light modulation of Hertzian microcracks on optical glass with thin film

Xinyu Luo, Peng Yang, Qian Li, Jing Qiu, Guanjun Liu
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Abstract

The research investigated the light modulation of Hertzian microcracks on K9 optical glass with SiO2 thin film by simulations. The simulations considered parameters such as crack degree, crack opening width, and crack depth. It was observed that the internal light intensity is positively correlated with the crack degree of the microcrack. At a crack degree of 55°, the peak of light intensity occurs at the thin film, indicating that the film layer may be damaged earlier by the laser. Laser damage may first occur in the thin film with a small opening width (<0.6 μm), and as the opening width increases, damage may occur inside the substrate of the optical element. Peak points of light intensity appeared inside the thin film and substrate at a crack depth of 1 μm, and as the depth increased, the substrate became more susceptible to laser damage.
光学玻璃上赫兹微裂纹的薄膜光调制
该研究通过模拟研究了带有二氧化硅薄膜的 K9 光学玻璃上赫兹微裂纹的光调制。模拟考虑了裂纹度、裂纹开口宽度和裂纹深度等参数。结果表明,内部光强与微裂纹的裂纹度呈正相关。当裂纹度为 55°时,光强峰值出现在薄膜处,这表明薄膜层可能较早受到激光的破坏。激光损伤可能首先发生在开口宽度较小(<0.6 μm)的薄膜上,随着开口宽度的增加,损伤可能发生在光学元件的基板内部。在裂纹深度为 1 μm 时,薄膜和基底内部会出现光强峰值点,随着裂纹深度的增加,基底更容易受到激光的破坏。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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