Influence of surface roughness on interfacial adsorption and laser ablation mechanisms of organic contaminants on fused silica

Tingting Wang, Qingshun Bai, Wanmin Guo, Xujie Liu, Yuhai Li
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Abstract

The deleterious effects of organic contaminants on optical components are a major obstacle to high-energy laser systems, and laser ablation is an important means of removing contaminants. Nevertheless, irregularities or flaws created during the manufacturing process of optical element surfaces affect the absorption of organic contaminants while placing higher demands on laser ablation. Hence, it is imperative to comprehend the intricate interplay among surface roughness, contaminant absorption, and ablation in order to effectively confront the challenge of laser-induced damage. In this study, the three-dimensional morphology of the fused silica surface was simulated numerically employing the Weierstrass-Mandelbrot fractal function. On this basis, we developed a theoretical model through molecular dynamics simulations to gain insight into the adsorption process of dodecane organic molecules on fused silica surfaces. Building upon the obtained outcomes, the effect of surface roughness on the laser removal of the adsorbed model is comprehensively analyzed. The findings reveal that dodecane molecules tend to aggregate within enclosed crevices and irregular regions, resulting in heightened localized density. Additionally, an augmented substrate surface roughness diminishes van der Waals energy and pressure, thereby facilitating the elimination of contaminants. These findings are indispensable for deepening our understanding of the dynamic interactions involving lasers, fused silica, and organic contaminants, as well as providing valuable insights into effectively addressing the challenging issue of laser-induced damage.
表面粗糙度对有机污染物在熔融石英上的界面吸附和激光烧蚀机制的影响
有机污染物对光学元件的有害影响是高能激光系统的一大障碍,而激光烧蚀是清除污染物的重要手段。然而,光学元件表面在制造过程中产生的不规则或缺陷会影响有机污染物的吸收,同时也对激光烧蚀提出了更高的要求。因此,必须理解表面粗糙度、污染物吸收和烧蚀之间错综复杂的相互作用,才能有效应对激光诱导损伤的挑战。在本研究中,我们利用魏尔斯特拉斯-曼德尔布罗特分形函数对熔融石英表面的三维形态进行了数值模拟。在此基础上,我们通过分子动力学模拟建立了一个理论模型,以深入了解十二烷有机分子在熔融石英表面的吸附过程。在此基础上,我们全面分析了表面粗糙度对激光去除吸附模型的影响。研究结果表明,十二烷分子倾向于在封闭的缝隙和不规则区域内聚集,导致局部密度增加。此外,基底表面粗糙度的增加会降低范德华能和压力,从而促进污染物的消除。这些发现对于加深我们对涉及激光、熔融石英和有机污染物的动态相互作用的理解是不可或缺的,同时也为有效解决激光诱导损伤这一棘手问题提供了宝贵的见解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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