GENERATION OF COMPENSATED ION-ELECTRON FLOW IN THE COMBINED MAGNETRON-ION-PLASMA SYSTEM

Abstract

The design and characteristics of the combined Magnetron-Ion-Plasma System (MIPS) are presented. The system includes a magnetron sputtering system and a Hall-type ion source with a common magnetic system and common power supply allowing the generation of quasi-neutral ion-electron flow, which provides complete charge neutralization on the processed dielectric surface. The formation of the anode electron layer and the energy spectra of ions are experimentally investigated. A phenomenological model of the combined discharge in EН fields is proposed. Theoretical calculations and experimental data are in reasonable agreement.