On the Uplink and Downlink EMF Exposure and Coverage in Dense Cellular Networks: A Stochastic Geometry Approach

Quentin Gontier, Charles Wiame, Joe Wiart, François Horlin, Christo Tsigros, Claude Oestges, Philippe De Doncker
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Abstract

Existing studies analyzing electromagnetic field (EMF) exposure in wireless networks have primarily considered downlink (DL) communications. In the uplink (UL), the EMF exposure caused by the user's smartphone is usually the only considered source of radiation, thereby ignoring contributions caused by other active neighboring devices. In addition, the network coverage and EMF exposure are typically analyzed independently for both the UL and DL, while a joint analysis would be necessary to fully understand the network performance. This paper aims at bridging the resulting gaps by presenting a comprehensive stochastic geometry framework including the above aspects. The proposed topology features base stations (BS) modeled via a homogeneous Poisson point process as well as a user process of type II (with users uniformly distributed in the Voronoi cell of each BS). In addition to the UL to DL exposure ratio, we derive joint probability metrics considering the UL and DL coverage and EMF exposure. These metrics are evaluated in two scenarios considering BS and/or user densifications. Our numerical results highlight the existence of optimal node densities maximizing these joint probabilities.
论密集蜂窝网络中的上行和下行电磁场暴露与覆盖:随机几何方法
现有的无线网络电磁场(EMF)暴露分析研究主要考虑的是下行链路(DL)通信。在上行链路(UL)中,用户的智能手机造成的电磁场暴露通常是唯一考虑的辐射源,从而忽略了其他邻近设备造成的辐射。此外,网络覆盖和电磁场辐射通常是对上行链路和下行链路进行独立分析,而要想全面了解网络性能,就必须进行联合分析。本文旨在通过提出一个包含上述方面的综合随机几何框架来弥补由此产生的差距。所提出的拓扑结构包括通过同质泊松点过程建模的基站(BS)以及 II 型用户过程(用户均匀分布在每个 BS 的 Voronoi 单元中)。除了 UL 与 DL 暴露比之外,我们还考虑了 UL 和 DL 覆盖范围以及 EMF 暴露的联合概率指标。在考虑到 BS 和/或用户密度的两种情况下对这些指标进行了评估。我们的数值结果表明,存在使这些联合概率最大化的最佳节点密度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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