Atomic layer deposition (ALD) of palladium: from processes to applications

IF 8.1 2区材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY

Critical Reviews in Solid State and Materials Sciences Pub Date : 2023-11-15 DOI:10.1080/10408436.2023.2273463

Clément Lausecker, David Muñoz-Rojas, Matthieu Weber

引用次数: 0

Abstract

Atomic layer deposition (ALD) has been successfully used for the deposition of palladium (Pd) thin films and nanostructures, with a wide range of applications in fields such as microelectronics, en...

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钯原子层沉积(ALD):从工艺到应用

原子层沉积技术(ALD)已成功地应用于钯(Pd)薄膜和纳米结构的沉积，在微电子、光电等领域有着广泛的应用。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Critical Reviews in Solid State and Materials Sciences 物理-材料科学：综合

CiteScore

22.10

自引率

2.80%

发文量

审稿时长

3 months

期刊介绍： Critical Reviews in Solid State and Materials Sciences covers a wide range of topics including solid state materials properties, processing, and applications. The journal provides insights into the latest developments and understandings in these areas, with an emphasis on new and emerging theoretical and experimental topics. It encompasses disciplines such as condensed matter physics, physical chemistry, materials science, and electrical, chemical, and mechanical engineering. Additionally, cross-disciplinary engineering and science specialties are included in the scope of the journal.