Electrodeposition of copper on a copper single crystal (111) face in the presence of bromide ions

Abstract

Observations were made of copper electrodeposits on the (111) plane of copper from highly purified solutions of copper sulphate containing known concentrations from 10^-3 to 10^-10 mol/l of HBr. The pyramidal growth becomes truncated and transforms to a layer growth which gives rise to ridges and then to a polycrystalline deposit. At higher current densities, transition from one type of growth to another is gradual.