Micro-Macro Simulation for Laser Processing of Semiconductor

Abstract

Recent developments in the simulations of processing of semiconductors and metals by femto- (10－15) second pulse laser, especially silicon and aluminum, are presented. Laser processing is a complex process involving nonlinear phenomena. We have developed microscopic first-principles calculations that describe the light-electron interaction, the semiclassical Vlasov equation that can also include relaxation in metal, and a novel temperature model that allows us to study the entire initial processing process. Each method allows us to analyze the entire process from the moment of laser irradiation to the stage of energy transfer to the lattice. This paper describes the details of the methods and the findings obtained from the results.