Calculation of Positron Annihilation Lifetime in Diamond Doped with B, Cr, Mo, Ti, W, Zr

None Zhao Yong-Sheng, None 阎峰云, None Yan Feng-Yun
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Abstract

Metal-matrix diamond composites have been extensively applied and studied, but vacancies, doping, and other defects caused by the pretreatment of the diamond surface significantly impact the interface performance between the metal base and diamond. Although techniques like transmission electron microscopy and spectroscopy analysis have been utilized for defect detection, they present certain limitations. Calculating the positron annihilation lifetime in diamond provides an accurate assessment of interface defects in the diamond. This study uses first-principles calculation methods, adopting various positron annihilation algorithms and enhancement factors, to compute the positron annihilation lifetime in ideal diamond crystals, single vacancies, and when doped with B, Cr, Mo, Ti, W, and Zr. The results, obtained using local density functional in combination with Boronski & Nieminen algorithms and RPA restriction as annihilation enhancement factors, indicate that the computed positron annihilation lifetime of diamond is 119.87ps, aligning closely with literature experimental results. Furthermore, after doping B, Cr, Mo, Ti, W, and Zr atoms in diamond (doping concentration of 1.6at%), the positron annihilation lifetime changed from a single vacancy 119.87ps to 148.57, 156.82, 119.05, 116.5, 117.62, and 115.74ps respectively. This implies that defects due to doped atoms in diamond alter its positron annihilation lifetime, with the impact varying according to the different atoms doped. Based on the calculated electron density in diamond vacancies and doped atom areas, it was discovered that doping atoms did not cause severe distortion in the diamond lattice. However, after doping B and Cr atoms, a significant increase in positron annihilation lifetime was noted. The primary reason is the relatively low positron affinity of B and Cr atoms, resulting in an extended positron residence time in the vacancy, thereby increasing the annihilation lifetime. Overall, vacancies and doped atom defects in diamond will cause changes in its positron annihilation lifetime, and the above conclusions provide crucial theoretical references for detecting and identifying interface defects caused by doping treatment on the diamond surface during the preparation of metal-matrix diamond composites.
掺杂B, Cr, Mo, Ti, W, Zr的金刚石中正电子湮没寿命的计算
金属基金刚石复合材料已经得到了广泛的应用和研究,但由于金刚石表面预处理导致的空位、掺杂等缺陷会严重影响金属基与金刚石的界面性能。虽然诸如透射电子显微镜和光谱分析等技术已被用于缺陷检测,但它们存在一定的局限性。计算金刚石中的正电子湮灭寿命可以准确地评估金刚石中的界面缺陷。本研究采用第一性原理计算方法,采用各种正电子湮灭算法和增强因子,计算了理想金刚石晶体、单空缺以及掺杂B、Cr、Mo、Ti、W和Zr时的正电子湮灭寿命。结合Boronski &Nieminen算法和RPA约束作为湮灭增强因子,计算得出金刚石正电子湮灭寿命为119.87ps,与文献实验结果吻合较好。此外,在掺杂浓度为1.6at%的金刚石中掺杂B、Cr、Mo、Ti、W和Zr原子后,正电子湮灭寿命分别从单空位119.87ps变为148.57、156.82、119.05、116.5、117.62和115.74ps。这表明,金刚石中掺杂原子的缺陷改变了其正电子湮灭寿命,其影响随掺杂原子的不同而不同。根据计算得到的金刚石空位和掺杂原子区域的电子密度,发现掺杂原子并没有引起金刚石晶格的严重畸变。然而,掺杂B和Cr原子后,正电子湮灭寿命显著增加。主要原因是B和Cr原子的正电子亲和力相对较低,导致正电子在空位中的停留时间延长,从而增加了湮灭寿命。综上所述,金刚石中的空位和掺杂原子缺陷会引起其正电子湮灭寿命的变化,上述结论为金属基金刚石复合材料制备过程中检测和识别金刚石表面掺杂处理引起的界面缺陷提供了重要的理论参考。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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