Radiation effect of vacuum ultraviolet on the performance of polyimide films

Jiaqi Chen, Tingting Zhao, Ling Zhou, Bo Xu, Yanyun Ju, Qimeng Zhang, Zhongkui Wu
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Abstract

AbstractPolyimide (PI) films equipped on the surface of spacecraft are susceptible to ultraviolet damage. Herein, the performance of two kinds of polyimide films i.e. 3,3',4,4'-biphenyl dianhydride-p-phenylenediamine (BPDA-PDA) and pyromellitic dianhydride-4,4'-oxydianiline (PMDA-ODA) under vacuum ultraviolet (VUV, 172 nm) irradiation was studied. The failure behavior of the PI films was studied by tensile tests, thermogravimetry (TGA), thermomechanical analysis (TMA), electric breakdown, UV-visible transmittance and scanning electron microscopy (SEM). Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS) were used to analyze the molecular structure. The results indicated that the tensile strength of BPDA-PDA PI and PMDA-ODA PI films decreased by 10.4% and 7.4% under VUV irradiation, respectively; the breakdown strength and UV-transmittance also deteriorated. Besides, the surface morphology of the PI films showed a large number of microcracks after VUV irradiation, which we ascribe to the breakage of imide rings (C-N-C) and ether bonds (C-O-C) of the PI films. However, the thermal stability (residual weight) of both PI films remained constant compared to the initial level; this can be explained by the combined effect of bond breaking and cross-linking of the polyimide films.Keywords: Polyimide filmVacuum ultravioletProperty evolutionMolecular structureDisclaimerAs a service to authors and researchers we are providing this version of an accepted manuscript (AM). Copyediting, typesetting, and review of the resulting proofs will be undertaken on this manuscript before final publication of the Version of Record (VoR). During production and pre-press, errors may be discovered which could affect the content, and all legal disclaimers that apply to the journal relate to these versions also.
真空紫外线辐射对聚酰亚胺薄膜性能的影响
摘要航天器表面的聚酰亚胺(PI)薄膜容易受到紫外线的损伤。本文研究了3,3′,4,4′-联苯二酐-对苯二胺(BPDA-PDA)和邻苯二酐-4,4′-氧化二胺(PMDA-ODA)两种聚酰亚胺薄膜在真空紫外线(VUV, 172 nm)照射下的性能。通过拉伸试验、热重分析(TGA)、热力学分析(TMA)、电击穿、紫外-可见透射率和扫描电镜(SEM)研究了PI膜的破坏行为。利用傅里叶变换红外光谱(FTIR)和x射线光电子能谱(XPS)分析了分子结构。结果表明:VUV辐照下,BPDA-PDA PI和PMDA-ODA PI薄膜的拉伸强度分别下降10.4%和7.4%;抗击穿强度和紫外线透过率也变差。此外,VUV辐照后的PI膜表面形貌显示出大量的微裂纹,这可能是由于PI膜的亚胺环(C-N-C)和醚键(C-O-C)断裂所致。然而,与初始水平相比,两种PI膜的热稳定性(残余重量)保持不变;这可以用聚酰亚胺薄膜断键和交联的共同作用来解释。关键词:聚酰亚胺薄膜真空紫外特性进化分子结构免责声明作为对作者和研究人员的服务,我们提供此版本的接受稿件(AM)。在最终出版版本记录(VoR)之前,将对该手稿进行编辑、排版和审查。在制作和印前,可能会发现可能影响内容的错误,所有适用于期刊的法律免责声明也与这些版本有关。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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