Role of Surface Defects on Photoinduced Reactivity in SiO2 Nanoparticles

Roberto D’Amato, Giulia Quaglia, Roberta Selvaggi, Fabio Marmottini, Loredana Latterini
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Abstract

Silica nanostructured materials find application in different fields, since they are cheap, versatile, and easy to functionalize as materials. However, silica reactivity has not been deeply investigated yet, mainly due to a poor understanding of how it is affected by superficial defects. In the present study, the electronic and optical properties of nanoparticles have been investigated using bare silica nanoparticles (SNP) and amino- or phosphonate-functionalized silica nanoparticles (SNP–APTES and SNP-phosphonate), prepared by a sol-gel procedure, and their morphology has been investigated using transmission electron microscopy (TEM) analysis. The prepared silica nanomaterials were characterized by means of reflectance and emission spectroscopies to determine the types of defects that can be found on silica nanoparticles’ surface. In order to understand the effect of surface defects on the reactivity of silica, the nanoparticles were employed for the photocatalytic degradation of Rhodamine 6G (R6G), upon selective irradiation at 320 nm, where only silica colloids absorb. The photoreaction was carried out in ethanol and in water and was monitored following the fluorescence signal of the dye. The evaluation of the fluorescent intensities allowed for the determination of the degradation efficiencies.
表面缺陷对SiO2纳米颗粒光致反应性的影响
二氧化硅纳米结构材料具有价格低廉、用途广泛、易于功能化等特点,在许多领域都有广泛的应用。然而,二氧化硅的反应性尚未深入研究,主要是由于对其如何受到表面缺陷的影响了解不足。在本研究中,采用溶胶-凝胶法制备了裸二氧化硅纳米粒子(SNP)和氨基或磷酸盐功能化二氧化硅纳米粒子(SNP - aptes和SNP-phosphonate),研究了纳米粒子的电子和光学性质,并利用透射电子显微镜(TEM)分析了它们的形貌。利用反射光谱和发射光谱对制备的二氧化硅纳米材料进行了表征,确定了二氧化硅纳米颗粒表面缺陷的类型。为了了解表面缺陷对二氧化硅反应性的影响,利用纳米颗粒在320 nm的选择性照射下光催化降解罗丹明6G (R6G),其中只有二氧化硅胶体吸收。在乙醇和水中进行光反应,并根据染料的荧光信号进行监测。对荧光强度的评价可用于测定降解效率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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