The Study of Velocity Field in Front Opening Unified Pod by CAE

Abstract

The front opening unified pod (FOUP) is a packing box for contamination control for semiconductor wafer transport. As the wafer fabrication process developes towards nanoor atom level, the semiconductor wafer storage device should advance from the particle prevention function into the airborne molecular contamination (AMC) removal function. Therefore, it is necessary to design/redesign a function for removing AMC or moisture inside the FOUP. This study used the design of leading diffuser tubes in the FOUP and pores in the surfaces of diffuser tubes to generate gas diffusion. This is to achieve a uniform distribution of the wafer surface velocity field and a uniform dehumidification function of the wafer surface. Based on the analysis results, when circular diffuser tubes are introduced in the FOUP and the intake air flow was set at 0.2-0.3 m3/hr, the interlayer wafer surface in the FOUP could achieve uniform distribution of velocity field. As a result, the humidity difference among various zones of wafer surface could be reduced, and the yield and quality of the wafer cutting process could be controlled.