The structure and micromechanical properties of TiAlSiN, TiAlSiCN coatings formed by the method of reactive magnetron sputtering

S. V. Konstantinov, F. F. Komarov, I. V. Chizhov, V. A. Zaikov
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Abstract

Nanostructured nitride TiAlSiN and carbonitride TiAlSiCN coatings are herein formed by reactive magnetron sputtering on various types of substrates: single-crystal silicon (100) and Titanium Grade2. To control and manage the coating process, the developed modular gas flow control complex (MGFCC) is used. The elemental composition is studied byenergy dispersive X-ray spectroscopy (EDX), the structure by X-ray diffraction (XRD), the morphology by scanning electron microscopy (SEM), whereas the micromechanical properties by nanoindentation. It is discovered that the formed coatings over the entire range of parameters α = 0.421–0.605 have a single-phase structure (Ti,Al)N, which is a disordered solid solution with a face-centered cubic (fcc) lattice. The average crystallite size of the (Ti,Al)N phase varies in the range (20–30) ± 5 nm. It is found that a decrease in the degree of reactivity α from α = 0.605 to α = 0.421 leads to an increase in the rate of deposition of nitride TiAlSiN and carbonitride TiAlSiСN coatings on silicon substrates by 200–300 %. The hardness of the formed coatings varies in the range H = 28.74–48.99 GPa, Young’s modulus E = 324.97–506.12 GPa. TiAlSiN, TiAlSiCN coatings demonstrate high values of impact strength indices H/E* = 0.07–0.12 and plastic deformation resistance indices H3/E* 2 = 0.13–0.72. It is detected that the degree of reactivity α has a significant effect on the micromechanical properties of the formed coatings. The structure and micromechanical properties of the formed nanostructured nitride and carbonitride TiAlSiN, TiAlSiCN coatings are suitable for use in space technology applications.
研究了反应磁控溅射法制备的TiAlSiN、TiAlSiCN涂层的结构和微观力学性能
纳米结构的氮化TiAlSiCN和碳氮化TiAlSiCN涂层是通过反应磁控溅射在各种类型的衬底上形成的:单晶硅(100)和2级钛。为了控制和管理涂层过程,采用了开发的模块化气体流量控制系统(MGFCC)。通过能量色散x射线能谱(EDX)、x射线衍射(XRD)、扫描电镜(SEM)研究了材料的元素组成,纳米压痕法研究了材料的微观力学性能。结果表明,在α = 0.421 ~ 0.605的整个参数范围内,所形成的涂层为(Ti,Al)N单相结构,为面心立方(fcc)晶格的无序固溶体。(Ti,Al)N相的平均晶粒尺寸为(20 ~ 30)±5 nm。结果表明,当反应度α从α = 0.605降低到α = 0.421时,氮化TiAlSiN和碳氮化TiAlSiСN涂层在硅基体上的沉积速率提高了200 ~ 300%。形成的涂层硬度H = 28.74 ~ 48.99 GPa,杨氏模量E = 324.97 ~ 506.12 GPa。TiAlSiN、TiAlSiCN涂层具有较高的冲击强度指标H/E* = 0.07 ~ 0.12,抗塑性变形指标H3/E* 2 = 0.13 ~ 0.72。结果表明,反应性α的高低对涂层的微观力学性能有显著影响。所制备的纳米氮化物和碳氮化物TiAlSiCN、TiAlSiCN涂层的结构和微观力学性能适合于空间技术应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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