Graphene/Aluminum oxide interfaces for nanoelectronic devices

IF 2.9 Q3 CHEMISTRY, PHYSICAL
Van Binh Vu, Jean-Luc Bubendorff, Louis Donald Mouafo, Sylvain Latil, Ahmad Zaarour, Jean-Francois Dayen, Laurent Simon, Yannick J Dappe
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引用次数: 0

Abstract

Abstract In this work, we study theoretically and experimentally graphene/aluminum oxide interfaces as 0D/2D interfaces for quantum electronics as the nature of the interface is of paramount importance to understand the quantum transport mechanism. Indeed, the electronic transport is driven either by a channel arising from a strong hybridization at the interface, or by tunneling across a van der Waals interface, with very different electric characteristics. By combining electronic spectroscopy and scanning microscopy with density functional theory calculations, we show that the interface is of weak and van der Waals nature. Quantum transport measurements in a single electron transistor confirm this result. Our results provide a first insight into the interfacial properties van der Waals materials based single electron device, and the key role played by the control of the interface states. The weak van der Waals coupling reported is promising for single electron device, where the control of the environmental charges is known to be a key challenge towards applications. Moreover, the unique vertical device architecture, enabled by the dual role of graphene including its vertical electric field transparency, opens the doors for a new class of single electron devices with higher scaling capability and functionalities. This work paves the way to new atomic environment control in single electron device.
纳米电子器件的石墨烯/氧化铝界面
在这项工作中,我们从理论上和实验上研究了石墨烯/氧化铝界面作为量子电子学的0D/2D界面,因为界面的性质对理解量子输运机制至关重要。事实上,电子输运要么是由界面处强杂化产生的通道驱动,要么是通过范德华界面的隧道驱动,它们具有非常不同的电特性。结合电子能谱、扫描显微镜和密度泛函理论计算,表明界面具有弱范德华性质。单电子晶体管中的量子输运测量证实了这一结果。我们的研究结果首次揭示了基于范德华材料的单电子器件的界面特性,以及界面态控制在其中所起的关键作用。报道的弱范德华耦合对于单电子器件是有希望的,其中环境电荷的控制已知是应用的关键挑战。此外,由于石墨烯的双重作用(包括其垂直电场透明度),其独特的垂直器件结构为具有更高缩放能力和功能的新型单电子器件打开了大门。这项工作为单电子器件的原子环境控制开辟了新的道路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
3.70
自引率
11.50%
发文量
46
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