Single event transient of SOI FinFET with total ionizing dose irradiation

Baojun Liu, Ping Zhou, Liang Qian
{"title":"Single event transient of SOI FinFET with total ionizing dose irradiation","authors":"Baojun Liu, Ping Zhou, Liang Qian","doi":"10.21595/vp.2023.23602","DOIUrl":null,"url":null,"abstract":"Total ionizing dose (TID) irradiation impacts the device leakage currents or threshold voltage, which affects the single event transient (SET) vulnerability of electronics under radiation environment. SET response of SOI FinFET at 14 nm technology node after TID exposure is carried out at different dose level. Results show that the drain current peak presents a slight fluctuant with total dose, while the collected charge and the bipolar amplification coefficient first decrease with total dose and then increase. The potential reason is also discussed from competing mechanisms associated with decreasing threshold voltage from TID irradiation and increasing the drain diffuse current from the potential of the channel.","PeriodicalId":262664,"journal":{"name":"Vibroengineering PROCEDIA","volume":"45 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-10-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vibroengineering PROCEDIA","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.21595/vp.2023.23602","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Total ionizing dose (TID) irradiation impacts the device leakage currents or threshold voltage, which affects the single event transient (SET) vulnerability of electronics under radiation environment. SET response of SOI FinFET at 14 nm technology node after TID exposure is carried out at different dose level. Results show that the drain current peak presents a slight fluctuant with total dose, while the collected charge and the bipolar amplification coefficient first decrease with total dose and then increase. The potential reason is also discussed from competing mechanisms associated with decreasing threshold voltage from TID irradiation and increasing the drain diffuse current from the potential of the channel.
总电离剂量辐照下SOI FinFET的单事件瞬态
总电离剂量(TID)辐照会影响器件的泄漏电流或阈值电压,从而影响电子器件在辐射环境下的单事件瞬态(SET)易损性。研究了不同剂量水平下TID照射后14 nm工艺节点SOI FinFET的SET响应。结果表明,漏极电流峰值随总剂量的变化呈轻微波动,而所收集的电荷和双极放大系数随总剂量的变化先减小后增大。本文还从离子辐照降低阈值电压和通道电位增加漏极漫溢电流的竞争机制出发,讨论了潜在的原因。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
CiteScore
0.80
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信