Coherence Improvement of Dual-Lens Electron Holography

Yun-Yu Wang, Zhouguang Wang, Qiang Jin
{"title":"Coherence Improvement of Dual-Lens Electron Holography","authors":"Yun-Yu Wang, Zhouguang Wang, Qiang Jin","doi":"10.1093/mictod/qaad027","DOIUrl":null,"url":null,"abstract":"Abstract Coherence is one of the limiting factors in off-axis electron holography applications. This paper reports methods to improve coherence ∼18-fold by using a smaller biprism and implementing a direct electron counting camera (K-camera) in combination with an imaging filter system. We achieved 0.4 nm fringe spacing with a 1.5 μm field-of-view and ∼33% fringe contrast. The maximum coherence number, N′, of ∼1.8 × 103 was achieved, where N′ is defined as the number of fringes times fringe contrast. High spatial resolution junction profile images (nm scale) of n-channel and p-channel field-effect transistors (nFET and pFET) are demonstrated with a large field-of-view (μm scale).","PeriodicalId":74194,"journal":{"name":"Microscopy today","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2023-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Microscopy today","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1093/mictod/qaad027","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Abstract Coherence is one of the limiting factors in off-axis electron holography applications. This paper reports methods to improve coherence ∼18-fold by using a smaller biprism and implementing a direct electron counting camera (K-camera) in combination with an imaging filter system. We achieved 0.4 nm fringe spacing with a 1.5 μm field-of-view and ∼33% fringe contrast. The maximum coherence number, N′, of ∼1.8 × 103 was achieved, where N′ is defined as the number of fringes times fringe contrast. High spatial resolution junction profile images (nm scale) of n-channel and p-channel field-effect transistors (nFET and pFET) are demonstrated with a large field-of-view (μm scale).
双透镜电子全息相干性的改进
相干性是离轴电子全息应用的限制因素之一。本文报告了通过使用较小的双棱镜和实现直接电子计数相机(k -相机)与成像滤光系统相结合来提高相干性约18倍的方法。我们实现了0.4 nm的条纹间距,1.5 μm的视场和~ 33%的条纹对比度。最大相干数N′达到了~ 1.8 × 103,其中N′定义为条纹数乘以条纹对比度。在大视场(μm尺度)下,展示了n沟道和p沟道场效应晶体管(nFET和pFET)的高空间分辨率结型图像(nm尺度)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信