High-speed atomic force microscopy in ultra-precision surface machining and measurement: challenges, solutions and opportunities

Q4 Materials Science
Chen Yang, Chao-Qun Dang, Wu-Le Zhu, Bing-Feng Ju
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Abstract

Abstract The atomic force microscope (AFM) possesses a unique capability for three-dimensional, high-resolution imaging down to the atomic level. It operates without the needs of additional requirements on sample material and environment, making it highly valuable for surface measurements. Recent advancements have further transformed AFM into a precision machining tool, thanks to its exceptional force measurement capability and positioning precision. High-speed AFM (HS-AFM) is a specialized branch of AFM that inherits the advantages of high spatial resolution of typical AFM but with significantly improved time resolution down to the sub-second level. In this article, instead of delving into extensive research progress enabled by HS-AFM in the broad fields of biology, biophysics, and materials science, we narrow our focus to the specific applications in the domain of ultra-precision surface machining and measurement. To the best of the authors’ knowledge, a comprehensive and systematic summary of the contributions that HS-AFM brings to this field is still lacking. This gap could potentially result in an underappreciation of its revolutionary capabilities. In light of this, we start from an overview of the primary operating modes of AFM, followed by a detailed analysis of the challenges that impose limitations on operational speed. Building upon these insights, we summarize solutions that enable high-speed operation in AFM. Furthermore, we explore a range of applications where HS-AFM has demonstrated its transformative capabilities. These include tip-based lithography (TBL), high-throughput metrology, and in-line inspection of nanofabrication processes. Lastly, this article discusses future research directions in HS-AFM, with a dedicated focus on propelling it beyond the boundaries of the laboratory and facilitating its widespread adoption in real-world applications.
超精密表面加工和测量中的高速原子力显微镜:挑战、解决方案和机遇
原子力显微镜(AFM)具有独特的三维、高分辨率成像到原子水平的能力。它的操作不需要对样品材料和环境的额外要求,使其对表面测量非常有价值。由于其卓越的力测量能力和定位精度,最近的进步进一步将AFM转变为精密加工工具。高速原子力显微镜(HS-AFM)是原子力显微镜的一个专门分支,它继承了典型原子力显微镜高空间分辨率的优点,但显著提高了亚秒级时间分辨率。在本文中,我们没有深入探讨HS-AFM在生物学、生物物理学和材料科学等广泛领域的广泛研究进展,而是将重点放在超精密表面加工和测量领域的具体应用上。据作者所知,目前还缺乏对HS-AFM在这一领域的贡献的全面和系统的总结。这一差距可能会导致对其革命性能力的低估。鉴于此,我们从AFM的主要操作模式的概述开始,然后详细分析了限制操作速度的挑战。基于这些见解,我们总结了在AFM中实现高速运行的解决方案。此外,我们探索了一系列应用,其中HS-AFM已经展示了其变革能力。这些包括尖端光刻(TBL),高通量计量和纳米制造过程的在线检查。最后,本文讨论了HS-AFM未来的研究方向,重点是推动其超越实验室的界限,并促进其在现实世界中的广泛应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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期刊介绍: The Indian Society for Surface Science and Technology is an organization for the cultivation, interaction and dissemination of knowledge in the field of surface science and technology. It also strives to promote Industry-Academia interaction
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