Adsorption and surface reactions of C2H2 and C2H4 on Co(0001)

Q4 Materials Science
Lingshun Xu, Zongfang Wu, Haocheng Wang, Junjie Shi, Zichen Li, Weixin Huang
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Abstract

Abstract In this paper we have studied adsorption and surface reactions of acetylene and ethylene on Co(0001) in detail by temperature desorption spectrum (TDS), X-ray photoelectron spectroscopy (XPS) and ultraviolet photoelectron spectroscopy (UPS). C 2 H 4 adsorption at 130 and 300 K followed by subsequent heating mainly forms C 2 clusters and graphitic carbon, respectively, while C 2 H 4 decomposes at 400 and 500 K to form dominant graphitic carbon and carbon adatoms, respectively. C 2 H 2 molecularly adsorbs at 130 K but exclusively dehydrogenates upon heating. The resulting C 2 H 2 (a) species at low coverages remains stable up to 400 K and then exclusively dehydrogenates into C 2 clusters, while the resulting C 2 H 2 (a) species at high coverages remains stable up to 310 K and then majorly dehydrocyclizates into (C 2 H) n intermediates with ring structures at 340 K which further dehydrogenates into graphitic carbon, and minorly dehydrogenates into C 2 clusters. Exposed at 370 K, C 2 H 2 dehydrocyclizates into (C 2 H) n intermediates with ring structures. These temperature and coverage dependent surface reactions of C 2 H 2 and C 2 H 4 on Co(0001) greatly enrich our fundamental understanding of Co-catalyzed F-T synthesis reaction.
C2H2和C2H4在Co(0001)上的吸附和表面反应
摘要利用温度解吸谱(TDS)、x射线光电子能谱(XPS)和紫外光电子能谱(UPS)研究了乙炔和乙烯在Co(0001)上的吸附和表面反应。在130 K和300 K时,c_2h4吸附和随后的加热分别主要形成c_2簇和石墨碳,而c_2h4在400 K和500 K时分解分别形成优势的石墨碳和碳吸附原子。c2h2在130 K时分子吸附,但加热后完全脱氢。低覆盖下的c2h (a)在400 K下保持稳定,然后完全脱氢成c2簇,而高覆盖下的c2h (a)在310 K下保持稳定,然后在340 K下主要脱氢成环状结构的(c2h) n中间体,进一步脱氢成石墨碳,少量脱氢成c2簇。暴露在370 K时,c2h脱氢成环状结构的(c2h) n中间体。这些与Co(0001)表面温度和覆盖有关的c2h2和c2h2o反应极大地丰富了我们对Co催化F-T合成反应的基本认识。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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期刊介绍: The Indian Society for Surface Science and Technology is an organization for the cultivation, interaction and dissemination of knowledge in the field of surface science and technology. It also strives to promote Industry-Academia interaction
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