Effect of yttrium doping on the photocatalytic properties of ZnO thin films

IF 0.9 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY

Physics and Chemistry of Solid State Pub Date : 2023-09-04 DOI:10.15330/pcss.24.3.422-428

L. Hrytsak, B. Turko, V. Vasil’ev, Y. Eliyashevskyy, A. Kostruba, A. Hrytsak

引用次数: 0

Abstract

Zinc oxide films with different levels of yttrium doping are deposited on glass substrates, using radio-frequency magnetron sputtering. Photocatalytic properties were investigated for such Y-doping weight concentration: 0, 2.4, 3.9, 4.7 wt. %. The studies showed that the Y-doping significantly improves the photocatalytic activity of the ZnO thin films. It was shown that the ZnO:Y 3.9 wt. % presents the highest degradation efficiency of 100 % during 80 minutes and the largest rate constant 9.6 · 10-2 min-1 among all samples.

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钇掺杂对ZnO薄膜光催化性能的影响

采用射频磁控溅射技术，在玻璃衬底上沉积了不同钇掺杂水平的氧化锌薄膜。研究了y掺杂质量浓度分别为0、2.4、3.9、4.7 wt. %时的光催化性能。研究表明，y掺杂显著提高了ZnO薄膜的光催化活性。结果表明，ZnO:Y为3.9 wt. %的样品在80 min内的降解效率最高，达到100%，降解速率常数最大，为9.6·10-2 min-1。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Physics and Chemistry of Solid State Multiple-

CiteScore

1.70

自引率

14.30%

发文量