Photoelastic Stress Induced by Maxillary Denture on the Mandibular Denture and Overdentures Lined with Silicone-based Material

Júlia Trevizam Campana, Mauro Antônio De Arruda Nóbilo, Rafael Leonardo Xediek Consani
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Abstract

Objectives: This study evaluated the stress induced by maxillary denture over mandibular denture and overdentures lined with silicone-based material. Materials and Methods: Three maxillary dentures, a mandibular denture, an overdenture supported by a single implant, and other supported by two implants were made for the following groups: MCD—Mandibular complete denture lined with silicone-based material, OSI—Overdenture lined with silicone-based material supported by single implant, and OTI— Overdenture lined with silicone-based material supported by two implants. The mandibular photoelastic model was axially loaded by the maxillary denture with intensities of 10, 20, or 30 kgf. Photoelastic analysis took place with the maxillary denture in maximum intercuspation with the mandibular prostheses. Results: Photoelastic analysis showed that the 10 kgf load promoted in the mandibular denture greater stress along the photoelastic model mainly in the anterior region. Stress occurred around the single implant with higher intensity at the apex. Stress occurred between the two implants and no stress was shown along the implants and apices. For 20 kgf, stress occurred in the anterior region of the mandible denture; Higher stress is shown around the single implant and apex and smaller at the mandible left side. Stress occurred between the two implants, and few stress at the apex of the left implant. For 30 kgf, stress occurred in the anterior region of the mandible with more intensity on the left side. Stress is shown around and at the implant apex and both mandible frontal sides. Stress is shown between the two implants and little stress at the apex of the left implant. Conclusions: The lined overdentures supported by single or two implants exhibited stress concentration in the implant region compared to lined mandibular denture showing stress along the mandible body. The stress in the overdentures occurred mainly around the single implant or between the two implants. The increase in load intensity had little influence on the increase in stress for the prostheses with lined bases. Clinical Relevance: Intercuspation in the overdenture must have the same importance given to the vertical relationship to relieve the chewing effort in overdenture lined with silicone-based material.
上颌义齿对下颌义齿和覆盖义齿硅基材料衬里的光弹性应力
目的:评价上颌义齿与下颌骨义齿和覆盖义齿复合硅基材料所引起的应力。材料与方法:制作3个上颌义齿、1个下颌骨义齿、1个单种植体支撑覆盖义齿和2个种植体支撑覆盖义齿,分别为:mcd -下颌硅基材料内衬全口义齿、si -单种植体支撑硅基材料内衬覆盖义齿和OTI -双种植体支撑硅基材料内衬覆盖义齿。下颌光弹性模型由上颌义齿轴向加载,强度分别为10、20或30 kgf。光弹性分析进行了最大间歇的上颌义齿与下颌义齿。结果:光弹性分析表明,10 kgf载荷使下颌义齿沿光弹性模型产生较大应力,主要在前区。应力发生在单个种植体周围,在顶端处强度较大。两个种植体之间存在应力,沿种植体和根尖没有应力。20kgf时,应力发生在下颌义齿前区;单种植体和尖部周围应力较高,下颌骨左侧应力较小。两个种植体之间存在应力,左侧种植体顶端应力较小。对于30 kgf,应力发生在下颌骨前区,左侧强度更大。应力显示在种植体顶端周围和下颌额侧。两个种植体之间显示应力,左侧种植体顶端应力很小。结论:单种植体或双种植体支撑的内衬覆盖义齿与沿下颌骨体的内衬覆盖义齿相比,应力集中在种植区。覆盖义齿的应力主要发生在单种植体周围或两种植体之间。载荷强度的增加对衬基修复体的应力增加影响不大。临床意义:在覆盖义齿内衬硅基材料中,为了减轻咀嚼力,夹层与垂直关系必须具有同样的重要性。
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