Molecular Dynamics Study on Effect of Interface Between Silicon and Silicon Carbide Crystals on Phonon Heat Conduction on Nanoscale

Xianhua Nie, Li Zhao, S. Deng, Yue Zhang, Zhenyu Du
{"title":"Molecular Dynamics Study on Effect of Interface Between Silicon and Silicon Carbide Crystals on Phonon Heat Conduction on Nanoscale","authors":"Xianhua Nie, Li Zhao, S. Deng, Yue Zhang, Zhenyu Du","doi":"10.1115/mnhmt2019-4114","DOIUrl":null,"url":null,"abstract":"\n Both silicon (Si) and silicon carbide (SiC) are promising materials used in nano-electro-mechanical system (NEMS), however, the understanding on its phonon heat conduction is rare, which restrict the performance improvement of NEMS. Moreover, the effects of the interface between crystals, which could significantly impact the phonon transport, on heat conduction are not sufficient in the existing publication pool. In this paper, two systems, Si/Si and Si/SiC, are simulated at different temperatures and temperature differences using molecular dynamics simulation and the results were analyzed.\n The temperature of Si inside Si/SiC system was set at 280K, and the temperatures of SiC were set as a certain absolute value based on temperature difference setting. Meanwhile, 6 groups of temperature difference are applied as simulated conditions. In addition, simulated results from Si/Si system are also applied in comparative analysis as a reference group. The results suggested that the existence of the interface of Si/SiC system would reduce the capability of heat conduction compared to the heat conduction of Si/Si and reverse temperature differences are discovered. When the average temperature is higher than 280K, the heat conduction rate of Si/SiC system is higher than that of Si/Si system initially and as the temperature differences between crystals increases to 60.90K, the heat conduction rate of Si/Si system is higher than that of Si/SiC system. Similar conclusion can also be obtained when the average temperature is lower than 280K. This work provides an open opportunity to study the effect of interface on phonon heat conduction between crystals at typical temperature differences and average temperatures.","PeriodicalId":331854,"journal":{"name":"ASME 2019 6th International Conference on Micro/Nanoscale Heat and Mass Transfer","volume":"230 ","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-07-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ASME 2019 6th International Conference on Micro/Nanoscale Heat and Mass Transfer","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1115/mnhmt2019-4114","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Both silicon (Si) and silicon carbide (SiC) are promising materials used in nano-electro-mechanical system (NEMS), however, the understanding on its phonon heat conduction is rare, which restrict the performance improvement of NEMS. Moreover, the effects of the interface between crystals, which could significantly impact the phonon transport, on heat conduction are not sufficient in the existing publication pool. In this paper, two systems, Si/Si and Si/SiC, are simulated at different temperatures and temperature differences using molecular dynamics simulation and the results were analyzed. The temperature of Si inside Si/SiC system was set at 280K, and the temperatures of SiC were set as a certain absolute value based on temperature difference setting. Meanwhile, 6 groups of temperature difference are applied as simulated conditions. In addition, simulated results from Si/Si system are also applied in comparative analysis as a reference group. The results suggested that the existence of the interface of Si/SiC system would reduce the capability of heat conduction compared to the heat conduction of Si/Si and reverse temperature differences are discovered. When the average temperature is higher than 280K, the heat conduction rate of Si/SiC system is higher than that of Si/Si system initially and as the temperature differences between crystals increases to 60.90K, the heat conduction rate of Si/Si system is higher than that of Si/SiC system. Similar conclusion can also be obtained when the average temperature is lower than 280K. This work provides an open opportunity to study the effect of interface on phonon heat conduction between crystals at typical temperature differences and average temperatures.
纳米尺度下硅与碳化硅晶体界面对声子热传导影响的分子动力学研究
硅(Si)和碳化硅(SiC)都是纳米机电系统(NEMS)中很有前途的材料,但对其声子热传导的了解很少,这限制了NEMS性能的提高。此外,晶体间界面对声子输运的影响在现有的文献中还不够充分。本文采用分子动力学模拟方法对Si/Si和Si/SiC两种体系在不同温度和温差下进行了模拟,并对结果进行了分析。将Si/SiC体系内的Si温度设定为280K,并根据温差设定将SiC温度设定为一定的绝对值。同时,采用6组温差作为模拟工况。此外,Si/Si系统的模拟结果也作为参照组应用于对比分析。结果表明,与Si/Si的导热性能相比,Si/SiC界面的存在会降低导热性能,并出现相反的温差。当平均温度高于280K时,Si/SiC体系的热传导率初始高于Si/Si体系,当晶体间温差增大到60.90K时,Si/Si体系的热传导率高于Si/SiC体系。当平均温度低于280K时,也可以得到类似的结论。本工作为在典型温差和平均温度下研究界面对晶体间声子热传导的影响提供了一个开放的机会。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信