Grace Period Harmonization in the Open Innovation Era

Toshiko Takenaka
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Abstract

This article urges European companies to discard their prejudices and work with their patent offices to adopt a grace period in the European Patent Convention (‘EPC’) in exchange for the United States’ reconciliation of the definition of the prior art, harmonizing the differences remaining after the America Invents Act (AIA). The negative view that European companies have taken of a grace period is contrary to the experience in Japan, where an unrestricted grace period helped large companies engage in open innovation and increase their use. Empirical studies have substantiated the negative impacts of the lack of a grace period on European SMEs and Universities. After highlighting the differences in the prior art under AIA and EPC, this article will conclude with a proposal for a 12-month, U.S.-style grace period to harmonize the patent systems in Paris Union member states. The adoption of this proposed grace period would result in a win-win outcome for both the United States and European countries.
开放创新时代的宽限期协调
本文敦促欧洲公司摒弃偏见,与他们的专利局合作,在《欧洲专利公约》(EPC)中采用宽限期,以换取美国对现有技术定义的和解,协调《美国发明法》(AIA)之后遗留的差异。欧洲企业对宽限期的负面看法与日本的经验相反,在日本,无限制的宽限期有助于大企业进行开放式创新并增加其使用。实证研究证实了宽限期缺乏对欧洲中小企业和大学的负面影响。在强调了AIA和EPC下现有技术的差异之后,本文将以一个美国式的12个月宽限期的建议来结束,以协调巴黎联盟成员国的专利制度。采用这一提议的宽限期将为美国和欧洲国家带来双赢的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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