Spherical indentation of compound semiconductors

J. Bradby, J. Williams, J. Wong-Leung, S. Kucheyev, M. Swain, P. Munroe
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引用次数: 23

Abstract

Abstract Details of indentation-induced mechanical deformation of GaAs, InP and GaN have been studied. In particular, the origin of the discontinuities in the load-penetration curves during loading (so-called ‘pop-in’ events) was examined. Cross-sectional transmission electron microscopy (XTEM) samples of indents were prepared using focused-ion-beam milling. Atomic force microscopy (AFM) was used to examine the surface deformation after indentation. In all materials, slip appeared to be the prime mechanism of plastic deformation, and, in contrast with Si, no evidence of pressure-induced phase changes was found. Slip along the {111} planes is clearly observed by XTEM and AFM in both GaAs and InP following indentation above the ‘pop-in’ threshold. At high loads, subsurface median cracking is also revealed in these materials. This cracking appeared to be nucleated at the intersection of the slip planes. This suggests that dislocation pile-up at the slip band intersection and the consequential shear stress build-up cause the nucleation of a microcrack. In contrast, although slip is observed in GaN (predominantly along the basal planes parallel to the surface), no cracking or film delamination has been found. The difference between the crystallographic structures and dislocation densities of wurtzite GaN and cubic GaAs and InP can account for the different deformation modes.
化合物半导体的球形压痕
摘要研究了GaAs、InP和GaN压痕引起的机械变形的细节。特别地,在加载期间(所谓的“弹出”事件)的加载-穿透曲线不连续的起源进行了检查。采用聚焦离子束铣削法制备了压痕的横截面透射电镜(XTEM)样品。采用原子力显微镜(AFM)观察压痕后的表面变形。在所有材料中,滑移似乎是塑性变形的主要机制,与Si相反,没有发现压力诱导相变的证据。XTEM和AFM清楚地观察到GaAs和InP在“弹出”阈值以上的压痕后沿{111}面滑动。在高载荷下,这些材料也会出现地下中间裂纹。裂缝在滑移面相交处呈核状。这表明,滑移带交叉处的位错堆积和相应的剪切应力积聚导致了微裂纹的成核。相比之下,虽然在氮化镓中观察到滑移(主要沿着平行于表面的基面),但没有发现开裂或薄膜分层。纤锌矿GaN与立方GaAs和InP的晶体结构和位错密度的差异可以解释不同的变形模式。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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