B. Courtois, K. Torki, S. Dumont, S. Eyraud, J.-F. Paillotin, G. D. Pendina
{"title":"Infrastructures for Education, Research and Industry in Microelectronics A Look Worldwide and a Look at India","authors":"B. Courtois, K. Torki, S. Dumont, S. Eyraud, J.-F. Paillotin, G. D. Pendina","doi":"10.1109/VLSI.Design.2009.17","DOIUrl":null,"url":null,"abstract":"Infrastructures to provide access to custom integrated hardware manufacturing facilities are important because they allow Students and Researchers to access professional facilities at a reasonable cost, and they allow Companies to access small volume production, otherwise difficult to obtain directly from manufacturers. This paper is reviewing the most recent developments at CMP like the introduction of a CMOS 45nm process, the cooperation between the major infrastructures services available worldwide and recent developments w.r.t. India. The conclusion is addressing technical developments as well as considerations like globalization and excellence.","PeriodicalId":267121,"journal":{"name":"2009 22nd International Conference on VLSI Design","volume":"155 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-01-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 22nd International Conference on VLSI Design","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSI.Design.2009.17","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Infrastructures to provide access to custom integrated hardware manufacturing facilities are important because they allow Students and Researchers to access professional facilities at a reasonable cost, and they allow Companies to access small volume production, otherwise difficult to obtain directly from manufacturers. This paper is reviewing the most recent developments at CMP like the introduction of a CMOS 45nm process, the cooperation between the major infrastructures services available worldwide and recent developments w.r.t. India. The conclusion is addressing technical developments as well as considerations like globalization and excellence.