Empirical Device Scaling and RF Performance Perspective: A Small Signal Model for GaN High Electron Mobility Transistor

A. Khusro, M. Hashmi, A. Q. Ansari
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引用次数: 2

Abstract

The paper proposes scaling effect of number of fingers (N) and effective gate width (weff) on model parameters and subsequently investigate the effect on RF performance characteristics of GaN High electron mobility transistor(HEMT). The device scaling relations in terms of model parameters and RF performance metrics are proposed for two multi-finger HEMTs of $2\times200 \mu m$ and $4\times00 \mu m$ respectively. The unity gain current frequency $(f_{t})$ is found to be approximately constant with very negligible increase while maximum unilateral gain frequency $(f_{max})$ increases with increase in number of fingers (N) provided that effective gate width (weff) remain constant. The whole investigation is based on accuracy of the parameter extraction procedure and small signal model developed using pinch-off and de-embedding structures. However, the effective width of both the HEMTs is equal.
经验器件缩放和射频性能展望:GaN高电子迁移率晶体管的小信号模型
本文提出了指数(N)和有效栅极宽度(weff)对模型参数的标度效应,进而研究了氮化镓高电子迁移率晶体管(HEMT)射频性能特性的影响。提出了两种多指hemt的模型参数和射频性能指标的缩放关系,分别为$2\times200 \mu m$和$4\times00 \mu m$。单位增益电流频率$(f_{t})$的增加几乎可以忽略不计,而最大单侧增益频率$(f_{max})$随着指数(N)的增加而增加,前提是有效栅极宽度(weff)保持不变。整个研究是基于参数提取过程的准确性和利用掐断和去嵌入结构建立的小信号模型。然而,两种hemt的有效宽度是相等的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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