{"title":"Diamond Polishing of Silicon","authors":"Robert E. Parks, C. Evans, A. Bartos","doi":"10.1364/oft.1994.otua1","DOIUrl":null,"url":null,"abstract":"Silicon is a widely used material in IR systems and electronics. Methods to rapidly produce surfaces of a specific geometry that are also free of subsurface damage lead to more cost effective manufacture of silicon products. In particular, we have been led to this study as a potential means of polishing diamond ground aspheric surfaces for IR imaging systems.","PeriodicalId":142307,"journal":{"name":"Optical Fabrication and Testing Workshop","volume":"15 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Fabrication and Testing Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/oft.1994.otua1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Silicon is a widely used material in IR systems and electronics. Methods to rapidly produce surfaces of a specific geometry that are also free of subsurface damage lead to more cost effective manufacture of silicon products. In particular, we have been led to this study as a potential means of polishing diamond ground aspheric surfaces for IR imaging systems.