Flatness Intercomparison Measurements Made on an Optical Flat

A. Slomba, C. G. Hull-Allen, P. Takacs, C. Evans, J. Bennett
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引用次数: 1

Abstract

A 4 inch (100 mm) diameter 0.75 inch (19 mm) thick fused silica optical flat is being used as the master to calibrate the 50 mm long slideways of the China Lake Nanostep Surface Profiler. The average of profiles taken along the 50 mm center sections of two mutually perpendicular diameters has been used for the calibration of the slideways. It is hoped that the Nanostep instrument will be capable of measuring absolute flatness. Until recently, the flat had been defined as being "perfectly flat" in order to obtain a slideways correction. Now actual measurements of the flatness have been undertaken at three laboratories, all using interferometric measurements but of different types. The persons who have taken the measurements and their laboratories are the first three groups of authors listed above. At the Optics and Applied Technology Laboratory, the optical flat was mounted vertically in a nonrestricting ring mount and comparisons were made with the flat being made part of a cavity in a Fizeau-type interferometer and the same cavity but without the optical flat. At Brookhaven National Laboratory, the flat was placed on its back and measurements were made with a pencil beam interferometer1,2 which measures surface slopes and then integrates them to obtain a surface profile. At the National Institute of Standards and Technology, a classical three flat interferometric intercomparison was made with the flat mounted vertically in a V-block. One profile from these last measurements is shown in Fig. 1 for the flatness along the full 100 mm diameter of one of the marked diameters. The measurements are an average of six independent determinations with a standard deviation of 0.52 nm. The dashed line is a polynomial fit through the data. Note that, according to these measurements, the flatness over the central 50 mm is very good indeed, with a peak-to-valley deviation of less than 2 nm.
在光学平面上进行的平面度比对测量
一个4英寸(100毫米)直径0.75英寸(19毫米)厚的熔融石英光学平板被用作主校准中国湖纳米级表面剖面仪的50毫米长的滑道。沿着两个相互垂直的直径的50mm中心截面取的平均值用于滑道的校准。希望Nanostep仪器能够测量绝对平面度。直到最近,平坦被定义为“完全平坦”,以获得滑轨修正。现在,对平面度的实际测量已经在三个实验室进行,都使用了不同类型的干涉测量法。进行测量的人员和他们的实验室是上面列出的前三组作者。在光学与应用技术实验室,将光学平片垂直安装在一个非约束环支架上,并与作为菲索干涉仪腔体一部分的平片和没有光学平片的同一腔体进行了比较。在布鲁克海文国家实验室,平板被放置在背面,用铅笔束干涉仪进行测量,该干涉仪测量表面坡度,然后将它们集成以获得表面轮廓。在美国国家标准与技术研究所,一个经典的三平面干涉测量相互比较是由平面垂直安装在一个v块。图1显示了这些最后测量的一个剖面,沿其中一个标记直径的完整100毫米直径的平面度。测量结果是六个独立测定的平均值,标准偏差为0.52 nm。虚线是通过数据拟合的多项式。请注意,根据这些测量,中央50毫米以上的平整度确实非常好,峰谷偏差小于2纳米。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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